Kim Jaegyeom, Kim Jong-Young, Ahn Heewon, Jeong Mu Hyeok, Lee Eunsil, Cho Keonhee, Lee Sung-Min, Shim Wooyoung, Pee Jae-Hwan
Icheon Branch, Korea Institute of Ceramic Engineering and Technology (KICET), 3321, Gyeongchung Rd., Sindun-Myeon, Icheon-si 467-843, Gyeonggi-do, Republic of Korea.
Department of Materials Sciences & Engineering, Multiscale Materials Laboratory, Yonsei University, 50, Yonsei-ro, Seodaemun-gu, Seoul 37022, Republic of Korea.
Materials (Basel). 2022 Nov 16;15(22):8125. doi: 10.3390/ma15228125.
Aluminum nitride, with its high thermal conductivity and insulating properties, is a promising candidate as a thermal dissipation material in optoelectronics and high-power logic devices. In this work, we have shown that the thermal conductivity and electrical resistivity of AlN ceramics are primarily governed by ionic defects created by oxygen dissolved in AlN grains, which are directly probed using Al NMR spectroscopy. We find that a 4-coordinated AlNO defect (O) in the AlN lattice is changed to intermediate AlNO, and further to 6-coordinated AlO with decreasing oxygen concentration. As the aluminum vacancy (V) defect, which is detrimental to thermal conductivity, is removed, the overall thermal conductivity is improved from 120 to 160 W/mK because of the relatively minor effect of the AlO defect on thermal conductivity. With the same total oxygen content, as the AlNO defect concentration decreases, thermal conductivity increases. The electrical resistivity of our AlN ceramics also increases with the removal of oxygen because the major ionic carrier is V. Our results show that to enhance the thermal conductivity and electrical resistivity of AlN ceramics, the dissolved oxygen in AlN grains should be removed first. This understanding of the local structure of Al-related defects enables us to design new thermal dissipation materials.
氮化铝具有高导热性和绝缘性能,是光电子学和高功率逻辑器件中有潜力的散热材料候选者。在这项工作中,我们表明,AlN陶瓷的热导率和电阻率主要由溶解在AlN晶粒中的氧产生的离子缺陷所控制,这些缺陷通过Al NMR光谱直接探测。我们发现,随着氧浓度降低,AlN晶格中的4配位AlNO缺陷(O)转变为中间的AlNO,并进一步转变为6配位的AlO。由于对热导率影响相对较小的AlO缺陷的存在,不利于热导率的铝空位(V)缺陷被去除后,整体热导率从120提高到160 W/mK。在总氧含量相同的情况下,随着AlNO缺陷浓度降低,热导率增加。我们的AlN陶瓷的电阻率也随着氧的去除而增加,因为主要的离子载流子是V。我们的结果表明,为了提高AlN陶瓷的热导率和电阻率,应首先去除AlN晶粒中溶解的氧。对Al相关缺陷局部结构的这种理解使我们能够设计新的散热材料。