Roh Ilpyo, Goh Seok Hyeon, Meng Yuan, Kim Justin S, Han Sangmoon, Xu Zhihao, Lee Han Eol, Kim Yeongin, Bae Sang-Hoon
Mechanical Engineering & Materials Science, Washington University in St. Louis, Saint Louis, MO, 63105, USA.
R&D CENTER, M.O.P Co., Ltd, Seoul, 07281, South Korea.
Nano Converg. 2023 Apr 30;10(1):20. doi: 10.1186/s40580-023-00369-3.
Epitaxy technology produces high-quality material building blocks that underpin various fields of applications. However, fundamental limitations exist for conventional epitaxy, such as the lattice matching constraints that have greatly narrowed down the choices of available epitaxial material combinations. Recent emerging epitaxy techniques such as remote and van der Waals epitaxy have shown exciting perspectives to overcome these limitations and provide freestanding nanomembranes for massive novel applications. Here, we review the mechanism and fundamentals for van der Waals and remote epitaxy to produce freestanding nanomembranes. Key benefits that are exclusive to these two growth strategies are comprehensively summarized. A number of original applications have also been discussed, highlighting the advantages of these freestanding films-based designs. Finally, we discuss the current limitations with possible solutions and potential future directions towards nanomembranes-based advanced heterogeneous integration.
外延技术生产出高质量的材料组件,这些组件是各种应用领域的基础。然而,传统外延存在一些基本限制,例如晶格匹配约束极大地限制了可用外延材料组合的选择。最近出现的远程外延和范德华外延等外延技术,展现出克服这些限制并为大量新型应用提供独立纳米膜的令人兴奋的前景。在此,我们回顾了范德华外延和远程外延制备独立纳米膜的机制和基本原理。全面总结了这两种生长策略独有的关键优势。还讨论了一些原创性应用,突出了这些基于独立薄膜设计的优势。最后,我们讨论了当前的限制、可能的解决方案以及基于纳米膜的先进异质集成的潜在未来方向。