Orlik Corey, Léveillé Sébastien, Arnab Salman M, Howansky Adrian F, Stavro Jann, Dow Scott, Kasap Safa, Tanioka Kenkichi, Goldan Amir H, Zhao Wei
Stony Brook University, Health Sciences Center L4-120, Department of Radiology, Stony Brook, New York, United States.
Analogic Canada Corporation, Saint-Laurent, Quebec, Canada.
J Med Imaging (Bellingham). 2024 Jan;11(1):013502. doi: 10.1117/1.JMI.11.1.013502. Epub 2024 Jan 13.
Active matrix flat panel imagers (AMFPIs) with thin-film transistor arrays experience image quality degradation by electronic noise in low-dose radiography and fluoroscopy. One potential solution is to overcome electronic noise using avalanche gain in an amorphous selenium (a-Se) (HARP) photoconductor in indirect AMFPI. In this work, we aim to improve temporal performance of HARP using a novel composite hole blocking layer (HBL) structure and increase optical quantum efficiency (OQE) to CsI:Tl scintillators by tellurium (Te) doping.
Two different HARP structures were fabricated: Composite HBL samples and Te-doped samples. Dark current and optical sensitivity measurements were performed on the composite HBL samples to evaluate avalanche gain and temporal performance. The OQE and temporal performance of the Te-doped samples were characterized by optical sensitivity measurements. A charge transport model was used to investigate the hole mobility and lifetime of the Te-doped samples in combination with time-of-flight measurements.
The composite HBL has excellent temporal performance, with ghosting below 3% at 10 mR equivalent exposure. Furthermore, the composite HBL samples have dark current and achieved an avalanche gain of 16. Te-doped samples increased OQE from 0.018 to 0.43 for 532 nm light. The addition of Te resulted in 2.1% first-frame lag, attributed to hole trapping within the layer.
The composite HBL and Te-doping can be utilized to improve upon the limitations of previously developed indirect HARP imagers, showing excellent temporal performance and increased OQE, respectively.
采用薄膜晶体管阵列的有源矩阵平板成像器(AMFPI)在低剂量射线照相和荧光透视中会因电子噪声而导致图像质量下降。一种潜在的解决方案是在间接AMFPI的非晶硒(a-Se)(HARP)光电导体中利用雪崩增益来克服电子噪声。在这项工作中,我们旨在使用新型复合空穴阻挡层(HBL)结构来提高HARP的时间性能,并通过碲(Te)掺杂提高碘化铯铊(CsI:Tl)闪烁体的光学量子效率(OQE)。
制备了两种不同的HARP结构:复合HBL样品和Te掺杂样品。对复合HBL样品进行暗电流和光学灵敏度测量,以评估雪崩增益和时间性能。通过光学灵敏度测量来表征Te掺杂样品的OQE和时间性能。结合飞行时间测量,使用电荷传输模型研究Te掺杂样品的空穴迁移率和寿命。
复合HBL具有优异的时间性能,在等效曝光量为10 mR时重影低于3%。此外,复合HBL样品的暗电流实现了16的雪崩增益。对于532 nm光,Te掺杂样品的OQE从0.018提高到了0.43。添加Te导致第一帧滞后2.1%,这归因于层内的空穴俘获。
复合HBL和Te掺杂可用于改善先前开发的间接HARP成像器的局限性,分别表现出优异的时间性能和提高的OQE。