Department of Dermatology, Radboudumc, Nijmegen, The Netherlands.
Department of Dermatology, Radboudumc, Nijmegen, The Netherlands; Department of Molecular Developmental Biology, Faculty of Science, Radboud University, Nijmegen, The Netherlands.
J Invest Dermatol. 2024 Nov;144(11):2488-2500.e4. doi: 10.1016/j.jid.2024.03.038. Epub 2024 Apr 19.
Three-dimensional human epidermal equivalents (HEEs) are a state-of-the-art organotypic culture model in preclinical investigative dermatology and regulatory toxicology. In this study, we investigated the utility of electrical impedance spectroscopy (EIS) for noninvasive measurement of HEE epidermal barrier function. Our setup comprised a custom-made lid fit with 12 electrode pairs aligned on the standard 24-transwell cell culture system. Serial EIS measurements for 7 consecutive days did not impact epidermal morphology, and readouts showed comparable trends with HEEs measured only once. We determined 2 frequency ranges in the resulting impedance spectra: a lower frequency range termed EIS correlated with keratinocyte terminal differentiation independent of epidermal thickness and a higher frequency range termed EIS correlated with stratum corneum thickness. HEEs generated from CRISPR/Cas9-engineered keratinocytes that lack key differentiation genes FLG, TFAP2A, AHR, or CLDN1 confirmed that keratinocyte terminal differentiation is the major parameter defining EIS. Exposure to proinflammatory psoriasis- or atopic dermatitis-associated cytokine cocktails lowered the expression of keratinocyte differentiation markers and reduced EIS. This cytokine-associated decrease in EIS was normalized after stimulation with therapeutic molecules. In conclusion, EIS provides a noninvasive system to consecutively and quantitatively assess HEE barrier function and to sensitively and objectively measure barrier development, defects, and repair.
三维人体表皮等效物(HEE)是临床前研究皮肤病学和监管毒理学的最先进的器官型培养模型。在这项研究中,我们研究了使用电阻抗谱(EIS)进行无创测量 HEE 表皮屏障功能的效用。我们的设置包括一个定制的盖子,上面有 12 对电极,与标准的 24 孔细胞培养系统对齐。连续 7 天进行的 EIS 测量不会影响表皮形态,并且读数显示与仅测量一次的 HEE 具有可比的趋势。我们在得出的阻抗谱中确定了 2 个频率范围:称为 EIS 的低频范围与角质形成细胞终末分化相关,而与表皮厚度无关,称为 EIS 的高频范围与角质层厚度相关。来自 CRISPR/Cas9 工程化角质形成细胞的 HEE 缺乏关键分化基因 FLG、TFAP2A、AHR 或 CLDN1,证实了角质形成细胞终末分化是定义 EIS 的主要参数。暴露于促炎银屑病或特应性皮炎相关细胞因子鸡尾酒会降低角质形成细胞分化标志物的表达并降低 EIS。用治疗分子刺激后,这种细胞因子相关的 EIS 降低得到了正常化。总之,EIS 提供了一种非侵入性的系统,可以连续和定量评估 HEE 屏障功能,并灵敏和客观地测量屏障的发育、缺陷和修复。