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质粒剂量对鼠伤寒沙门氏菌紫外线、可见光及甲基磺酸甲酯诱变作用的影响。

Plasmid-dosage effects on ultraviolet, visible light and methyl methanesulfonate mutagenesis in Salmonella typhimurium.

作者信息

Brunner D P, Brehm T M

出版信息

Mutat Res. 1985 Sep;151(2):185-94. doi: 10.1016/0027-5107(85)90070-3.

Abstract

Salmonella typhimurium LT2 strains bearing plasmids pKM101, R64 or pColIb-P9 demonstrated enhanced UV survival when compared with strains not bearing plasmids. A strain of S. typhimurium bearing both pKM101 and pColIb-P9 survived UV irradiation slightly better than either of the single-plasmid strains. Spontaneous reversion of the hisG46 and trpE8 missense alleles was enhanced in each single-plasmid strain, and for the dual-plasmid strain containing pKM101 and pColIb-P9 enhancement represented a near additivity of the response seen for the single-plasmid strains. Following exposure to UV or visible-light irradiation, reversion of hisG46 and trpE8 was also enhanced in each single-plasmid strain, but quantitatively greater in the dual-plasmid strain and was equal to or slightly greater than additive the responses of the single-plasmid strains. In contrast to visible-light irradiation, UV exposure resulted in two phenotypic Trp+-revertant classes. One Trp+ class, having normal colony size (2.0 mm) and similar in number to His+ revertants, was comprised of intragenic revertants of trpE8, while the predominant Trp+ class, having smaller colony size (0.8 mm), represented intergenic suppressor revertants, illuminating the differences in mutation and/or repair specificity for UV and visible-light exposure. Methyl methane-sulfonate (MMS)-induced reversion of hisG46 was similar in effect to that seen with UV or visible-light irradiation. Plasmids pKM101 or pColIb-P9 enhanced the frequency of hisG46 reversion, while a more than additive response was seen in a strain with both plasmids. Furthermore, MMS-induced reversion of hisG46 was also observed to be greatest in a strain bearing plasmid R64 (incompatibility group I alpha) and pKM101, when compared with single-plasmid strains bearing either R64 or pKM101.

摘要

与不含质粒的菌株相比,携带质粒pKM101、R64或pColIb - P9的鼠伤寒沙门氏菌LT2菌株表现出更高的紫外线存活率。一株同时携带pKM101和pColIb - P9的鼠伤寒沙门氏菌菌株在紫外线照射下的存活情况略优于任何一种单质粒菌株。在每个单质粒菌株中,hisG46和trpE8错义等位基因的自发回复突变均有所增强,对于同时含有pKM101和pColIb - P9的双质粒菌株,这种增强作用几乎是单质粒菌株所观察到的反应的累加。在暴露于紫外线或可见光照射后,每个单质粒菌株中hisG46和trpE8的回复突变也有所增强,但在双质粒菌株中数量上更多,并且等于或略大于单质粒菌株反应的累加。与可见光照射不同,紫外线暴露导致出现两种表型的Trp + 回复突变体类别。一个Trp + 类别具有正常菌落大小(2.0毫米)且数量与His + 回复突变体相似,由trpE8的基因内回复突变体组成,而占主导的Trp + 类别具有较小菌落大小(0.8毫米),代表基因间抑制回复突变体,这揭示了紫外线和可见光暴露在突变和/或修复特异性方面的差异。甲磺酸甲酯(MMS)诱导的hisG46回复突变的效果与紫外线或可见光照射相似。质粒pKM101或pColIb - P9提高了hisG46回复突变的频率,而在同时含有两种质粒的菌株中观察到的反应具有超过累加的效果。此外,与携带R64或pKM101的单质粒菌株相比,在携带质粒R64(不相容群Iα)和pKM101的菌株中,MMS诱导的hisG46回复突变也被观察到是最大的。

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