Ji Gangqiang, Ma Longfei, Wu Liyun
Engineering Training Center, Taiyuan Institute of Technology, Taiyuan, 030008, People's Republic of China.
Northern Shanxi Machinery Manufacturing Limited Liability Company, Taiyuan, 030009, People's Republic of China.
Sci Rep. 2024 Sep 27;14(1):22099. doi: 10.1038/s41598-024-74263-1.
In recent years, electrolytic plasma polishing technology has attracted wide attention due to its advantages of shape adaptability, high efficiency, better precision, environmental friendliness, and non-contact polishing. However, the lack of research on the evolution mechanism of the gas layer at the anode interface restricts the improvement of the material removal mechanism and the regulation of the polishing effect. Firstly, the thermodynamic conditions of gas layer formation were analyzed based on the Clapeyron-Clausius equation, and the key parameters affecting the gas layer were identified. Secondly, the laws of voltage and electrolyte temperature on the dynamic evolution of the gas layer and its polishing effect were revealed. Additionally, the influence of the gas layer on the voltage-current characteristics was also investigated by analyzing the experimental phenomena. The results indicate that the optimal polishing effect is achieved at a voltage level of 300 V resulting in a decrease in Ra from 0.451 μm to 0.076 μm. Similarly, superior polishing results are obtained when the electrolyte temperature is 80 °C, with a decrease in R from 0.451 μm to 0.075 μm. This study provides theoretical guidance for the further development and application of electrolytic plasma polishing technology.
近年来，电解等离子体抛光技术因其形状适应性强、效率高、精度更高、环境友好以及非接触抛光等优点而备受关注。然而，对阳极界面处气体层演化机理的研究不足，限制了材料去除机理的完善和抛光效果的调控。首先，基于克拉佩龙 - 克劳修斯方程分析了气体层形成的热力学条件，并确定了影响气体层的关键参数。其次，揭示了电压和电解液温度对气体层动态演化及其抛光效果的规律。此外，还通过分析实验现象研究了气体层对电压 - 电流特性的影响。结果表明，在300V的电压水平下可实现最佳抛光效果，使表面粗糙度平均值（Ra）从0.451μm降至0.076μm。同样，当电解液温度为80°C时，可获得优异的抛光结果，表面粗糙度平均值（Ra）从0.451μm降至0.075μm。本研究为电解等离子体抛光技术的进一步发展和应用提供了理论指导。
