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解析三层3R-MoS中滑动铁电的极化切换路径

Resolving polarization switching pathways of sliding ferroelectricity in trilayer 3R-MoS.

作者信息

Liang Jing, Yang Dongyang, Wu Jingda, Xiao Yunhuan, Watanabe Kenji, Taniguchi Takashi, Dadap Jerry I, Ye Ziliang

机构信息

Quantum Matter Institute, The University of British Columbia, Vancouver, BC, Canada.

Department of Physics and Astronomy, The University of British Columbia, Vancouver, BC, Canada.

出版信息

Nat Nanotechnol. 2025 Apr;20(4):500-506. doi: 10.1038/s41565-025-01862-y. Epub 2025 Feb 3.

Abstract

Sliding ferroelectricity, an emerging type of hysteretic behaviour with strong potential for memory-related applications, involves dynamically switching the polarization associated with the stacking arrangement in two-dimensional van der Waals materials. Because different stacking configurations can share a degenerate net polarization, it has remained a challenge to resolve the intermediate stacking configuration and the polarization switching pathway in multi-interface devices. In this work, we present an optical approach to resolve the polarization degeneracy in a trilayer 3R-MoS over different switching cycles. By performing reflection contrast spectroscopy in dual-gated devices, we identify distinct responses of inter- and intralayer excitons in all four possible stacking configurations (ABC, ABA, BAB and CBA). Diffraction-limited spatial resolution makes it possible to image the switching of the stacking configurations. We find that the switching pathway is influenced not only by the competition among pinning centres-which localize domain walls at different interfaces-but also by a free-carrier screening effect linked to chemical doping. These findings highlight the importance of managing domain walls, pinning centres and doping levels in sliding ferroelectric devices, offering insights for further development in sensing and computing applications.

摘要

滑动铁电,一种具有与记忆相关应用强大潜力的新兴滞后行为类型,涉及在二维范德华材料中动态切换与堆叠排列相关的极化。由于不同的堆叠构型可以共享简并的净极化,因此在多界面器件中解析中间堆叠构型和极化切换路径仍然是一个挑战。在这项工作中,我们提出了一种光学方法来解析三层3R-MoS在不同切换周期中的极化简并性。通过在双栅极器件中进行反射对比光谱,我们识别出在所有四种可能的堆叠构型(ABC、ABA、BAB和CBA)中,层间和层内激子的不同响应。衍射极限空间分辨率使得对堆叠构型的切换进行成像成为可能。我们发现,切换路径不仅受钉扎中心之间的竞争影响(钉扎中心在不同界面处定位畴壁),还受与化学掺杂相关的自由载流子屏蔽效应影响。这些发现突出了在滑动铁电器件中管理畴壁、钉扎中心和掺杂水平的重要性,为传感和计算应用的进一步发展提供了见解。

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