Suppr超能文献

含尿嘧啶和腺嘌呤的碱基、核苷、核苷酸及多核苷酸的损伤:193和254nm照射下的量子产率

Damage to uracil- and adenine-containing bases, nucleosides, nucleotides and polynucleotides: quantum yields on irradiation at 193 and 254 nm.

作者信息

Gurzadyan G G, Görner H

机构信息

Max Planck Institut für Strahlenchemie, Mülheim an der Ruhr, Germany.

出版信息

Photochem Photobiol. 1994 Oct;60(4):323-32. doi: 10.1111/j.1751-1097.1994.tb05111.x.

Abstract

Photoreactions, such as base release and decomposition of the base moiety, induced by either 20 ns laser pulses at 193 nm or continuous 254 nm irradiation, were studied for a series of uracil and adenine derivatives in neutral aqueous solution. The quantum yield of chromophore loss (phi cl) depends significantly on the nature of the nucleic acid constituent and the saturating gas (Ar, N2O or O2). In the case of polynucleotides the destruction of nucleotides was measured by high-performance liquid chromatography after hydrolysis; the quantum yields (phi dn) are comparable to those of chromophore loss or larger. The phi cl and phi dn of 0.04-0.1 for poly(U) and poly(dU), obtained for both wavelengths of irradiation, are due to processes originating from the lowest excited singlet state, i.e. formation of photohydrates and photodimers, and a second part from photoionization using lambda irr = 193 nm. Irradiation at 193 nm effectively splits pyrimidine dimers and thus reverts them into monomers. The quantum yield for release of undamaged bases (phi br) from nucleosides, nucleotides and polynucleotides upon irradiation at 254 nm is typically phi br = (0.1-1) x 10(-4). Breakage of the N-glycosidic bond is significantly more efficient for lambda irr = 193 nm, e.g. phi br = 1.1 x 10(-3), 0.8 x 10(-3), 4.3 x 10(-3) and 0.5 x 10(-3) for poly(A), poly(dA), poly(U) and poly(dU) in Ar-saturated solution, respectively. Enhanced phi values for lambda irr = 193 nm, essentially for adenine and its derivatives, are caused by photoprocesses that are initiated by photoionization.

摘要

在中性水溶液中,研究了一系列尿嘧啶和腺嘌呤衍生物在193nm处20ns激光脉冲或254nm连续照射下引发的光反应,如碱基释放和碱基部分的分解。发色团损失的量子产率(φcl)显著取决于核酸成分和饱和气体(氩气、一氧化二氮或氧气)的性质。对于多核苷酸,水解后通过高效液相色谱法测量核苷酸的破坏情况;量子产率(φdn)与发色团损失的量子产率相当或更高。对于聚尿嘧啶(poly(U))和聚脱氧尿嘧啶(poly(dU)),在两种照射波长下获得的φcl和φdn为0.04 - 0.1,这是由于源自最低激发单重态的过程,即光水合物和光二聚体的形成,以及使用λirr = 193nm时的光电离产生的另一部分过程。193nm的照射有效地分解了嘧啶二聚体,从而将它们还原为单体。在254nm照射下,核苷、核苷酸和多核苷酸中未受损碱基释放的量子产率(φbr)通常为φbr = (0.1 - 1)×10⁻⁴。对于λirr = 193nm,N - 糖苷键的断裂效率显著更高,例如在氩气饱和溶液中,聚腺嘌呤(poly(A))、聚脱氧腺嘌呤(poly(dA))、聚尿嘧啶(poly(U))和聚脱氧尿嘧啶(poly(dU))的φbr分别为1.1×10⁻³、0.8×10⁻³、4.3×10⁻³和0.5×10⁻³。对于λirr = 193nm,主要是腺嘌呤及其衍生物的φ值增强,这是由光电离引发的光过程导致的。

文献AI研究员

20分钟写一篇综述,助力文献阅读效率提升50倍。

立即体验

用中文搜PubMed

大模型驱动的PubMed中文搜索引擎

马上搜索

文档翻译

学术文献翻译模型,支持多种主流文档格式。

立即体验