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剪切流作用下两相流体中的界面与接触线运动

Interface and contact line motion in a two phase fluid under shear flow.

作者信息

Chen HY, Jasnow D, Vinals J

机构信息

Department of Physics and Astronomy, University of Pittsburgh, Pittsburgh, Pennsylvania 15260, USA.

出版信息

Phys Rev Lett. 2000 Aug 21;85(8):1686-9. doi: 10.1103/PhysRevLett.85.1686.

Abstract

We use a coarse grained description to study the steady state interfacial configuration of a two phase fluid under steady shear. Dissipative relaxation of the order parameter leads to interfacial slip at the contact line, even with no-slip boundary conditions on the fluid velocity. This relaxation occurs within a characteristic length scale l(0) = sqrt[xiD/V0], with xi the (microscopic) interfacial thickness, D an order parameter diffusivity, and V0 the boundary velocity. The steady state interfacial configuration is shown to satisfy a scaling form involving the ratio l(0)/L, where L is the width of the fluid layer, for a passive interface, and the capillary number as well for an active interface.

摘要

我们使用粗粒化描述来研究在稳定剪切作用下两相流体的稳态界面构型。序参量的耗散弛豫导致接触线处的界面滑移,即使流体速度满足无滑移边界条件。这种弛豫发生在特征长度尺度(l(0)=\sqrt[xiD/V0])范围内,其中(xi)为(微观)界面厚度,(D)为序参量扩散率,(V0)为边界速度。对于被动界面,稳态界面构型满足一种涉及(l(0)/L)比值的标度形式,其中(L)为流体层宽度;对于主动界面,还涉及毛细数。

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