Karma A
Physics Department and Center for Interdisciplinary Research on Complex Systems, Northeastern University, Boston, Massachusetts 02115, USA.
Phys Rev Lett. 2001 Sep 10;87(11):115701. doi: 10.1103/PhysRevLett.87.115701. Epub 2001 Aug 27.
A phase-field formulation is introduced to simulate quantitatively microstructural pattern formation in alloys. The thin-interface limit of this formulation yields a much less stringent restriction on the choice of interface thickness than previous formulations and permits one to eliminate nonequilibrium effects at the interface. Dendrite growth simulations with vanishing solid diffusivity show that both the interface evolution and the solute profile in the solid are accurately modeled by this approach.
引入了一种相场公式来定量模拟合金中的微观结构图案形成。与之前的公式相比,该公式的薄界面极限对界面厚度的选择限制要宽松得多,并允许消除界面处的非平衡效应。固体扩散率为零的枝晶生长模拟表明,这种方法能够准确地模拟界面演化和固体中的溶质分布。