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在855兆电子伏特电子束能量下对光学史密斯-珀塞尔辐射的观测。

Observation of optical Smith-Purcell radiation at an electron beam energy of 855 MeV.

作者信息

Kube G, Backe H, Euteneuer H, Grendel A, Hagenbuck F, Hartmann H, Kaiser K H, Lauth W, Schöpe H, Wagner G, Walcher Th, Kretzschmar M

机构信息

Institut für Kernphysik, Universität Mainz, D-55099 Mainz, Germany.

出版信息

Phys Rev E Stat Nonlin Soft Matter Phys. 2002 May;65(5 Pt 2):056501. doi: 10.1103/PhysRevE.65.056501. Epub 2002 May 8.

Abstract

Smith-Purcell radiation, generated when a beam of charged particles passes close to the surface of a diffraction grating, has been studied in the visible spectral range at wavelengths of 360 and 546 nm with the low emittance 855 MeV electron beam of the Mainz Microtron MAMI. The beam focused to a spot size of 4 microm (full width at half maximum) passed over optical diffraction gratings of echelle profiles with blaze angles of 0.8 degrees, 17.27 degrees, and 41.12 degrees and grating periods of 0.833 and 9.09 microm. Taking advantage of the specific emission characteristics of Smith-Purcell radiation a clear separation from background components, such as diffracted synchrotron radiation from upstream beam optical elements and transition radiation, was possible. The intensity scales with a modified Bessel function of the first kind as a function of the distance between electron beam and grating surface. Experimental radiation factors have been determined and compared with calculations on the basis of Van den Berg's theory [P.M. Van den Berg, J. Opt. Soc. Am. 63, 689 (1973)]. Fair agreement has been found for gratings with large blaze angles while the measurement with the shallow grating (blaze angle 0.8 degrees ) is at variance with this theory. Finally, the optimal operational parameters of a Smith-Purcell radiation source in view of already existing powerful undulator sources are discussed.

摘要

当一束带电粒子束靠近衍射光栅表面通过时产生的史密斯-珀塞尔辐射,已在可见光光谱范围内,利用美因茨微tron MAMI的低发射度855 MeV电子束,在波长为360和546 nm的情况下进行了研究。聚焦到光斑尺寸为4微米(半高宽)的电子束通过了闪耀角分别为0.8度、17.27度和41.12度、光栅周期分别为0.833和9.09微米的阶梯光栅轮廓的光学衍射光栅。利用史密斯-珀塞尔辐射的特定发射特性,可以将其与背景成分,如来自上游束流光学元件的衍射同步辐射和过渡辐射,清晰地分离。强度随第一类修正贝塞尔函数变化,是电子束与光栅表面之间距离的函数。已确定了实验辐射因子,并与基于范登伯格理论[P.M.范登伯格,《美国光学学会杂志》63, 689 (1973)]的计算结果进行了比较。对于大闪耀角的光栅,发现结果相当吻合,而对于浅光栅(闪耀角0.8度)的测量结果与该理论不一致。最后,鉴于现有的强大波荡器源,讨论了史密斯-珀塞尔辐射源的最佳运行参数。

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