Föglein K A, Szépvölgyi J, Dombi A
Department of Inorganic and Analytical Chemistry, University of Szeged, H-6701 Szeged, PO Box 440, Hungary.
Chemosphere. 2003 Jan;50(1):9-13. doi: 10.1016/s0045-6535(02)00372-7.
A silent electric discharge was applied to decompose halogenated methanes including CCl4, CHCl3, CFCl3, CF2Cl2 and CF3Cl, in argon-containing gas mixtures. The decompositions of the target compounds were studied in static reactors at a fixed electric field and room temperature. The reaction products were analyzed by FT-IR spectroscopy, gas chromatography and UV spectrophotometry. The results demonstrated, that the radical-type decomposition of chlorofluoromethanes led to products formed by realignment of the halogen atoms. The decomposition of CCl4 was faster than that of the cholorofluoromethanes, and produced perchloroethane and chlorine. CHCl3 exhibited the highest decomposition rate and produced a large variety of products.
在含氩气体混合物中施加无声放电以分解包括四氯化碳、三氯甲烷、三氟一氯甲烷、二氟二氯甲烷和三氟一氯甲烷在内的卤代甲烷。在固定电场和室温下于静态反应器中研究目标化合物的分解情况。通过傅里叶变换红外光谱法、气相色谱法和紫外分光光度法分析反应产物。结果表明,氯氟甲烷的自由基型分解导致产物通过卤原子的重新排列而形成。四氯化碳的分解速度比氯氟甲烷快,并生成六氯乙烷和氯气。三氯甲烷表现出最高分解速率并产生多种产物。