Shen Yung-Shuen, Lin Chi-Chang
Department of Engineering, Da-Yeh University, Taiwan, Republic of China.
Water Environ Res. 2003 Jan-Feb;75(1):54-60. doi: 10.2175/106143003x140827.
The decomposition of catechol (o-hydrophenol) and resorcinol (m-hydrophenol) in aqueous solution by 254-nm UV direct photolysis and the UV-hydrogen peroxide (H2O2) process under various solution pH values was studied. The light absorbance and photolytic properties of catechol and resorcinol were found to be highly dependent on solution pH and can be adequately described with a three-species distribution model. For the UV-H2O2 process, the individual contribution to the decomposition of pollutants by direct photolysis and indirect hydroxyl radical destruction was differentiated by studying the linear addition of UV light absorbance of various reactant species. The contribution to the decomposition of the two hydrophenols by hydroxyl radical destruction was more than 95% in acidic and neural solutions for treatment with the UV-H2O2 process.
研究了在不同溶液pH值下,邻苯二酚(邻羟基苯酚)和间苯二酚(间羟基苯酚)在水溶液中通过254 nm紫外直接光解以及紫外-过氧化氢(H₂O₂)工艺的分解情况。发现邻苯二酚和间苯二酚的吸光度和光解特性高度依赖于溶液pH值,并且可以用三物种分布模型进行充分描述。对于紫外-H₂O₂工艺,通过研究各种反应物物种的紫外吸光度的线性加和,区分了直接光解和间接羟基自由基破坏对污染物分解的各自贡献。在用紫外-H₂O₂工艺处理的酸性和中性溶液中,羟基自由基破坏对两种羟基苯酚分解的贡献超过95%。