Hong Kyo-Min, Kim Moon-Sun, Chung Jaygwan G
Department of Chemical Engineering, Sungkyunkwan University, 300 Chonchondong, Janganku, Suwon 440-746, South Korea.
Chemosphere. 2004 Feb;54(7):927-34. doi: 10.1016/j.chemosphere.2003.08.036.
The adsorption experiment of nickel ion [Ni(II)] on gamma-type alumina by a differential bed reactor in aqueous solutions was investigated to determine the adsorption characteristics and overall adsorption rate. The adsorbed amount increased rapidly with pH from pH 2 to 6 and kept constant over pH 6. The adsorbed amount of Ni(II) increased with temperature from 20 to 50 degrees C. Correlation coefficients (R2) of Langmuir and Freundlich adsorption isotherms were 0.9268 and 0.9489, respectively, and Freundlich isotherm was more suitable for adsorption on gamma-type alumina than Langmuir isotherm. The overall adsorption rate of Ni(II) on gamma-type alumina at pH 6 by a differential bed rector was determined as follows: r = 68.77Ce(1.61) - 17.60qe(0.36). Al(III) ions in solutions were away from the alumina surface during the adsorption of Ni(II) and Al(III) concentration increased with an increasing Ni(II) adsorbed amount on alumina.
采用微分床反应器研究了水溶液中γ型氧化铝对镍离子[Ni(II)]的吸附实验,以确定吸附特性和总吸附速率。吸附量在pH值从2增加到6时迅速增加,在pH值大于6时保持恒定。Ni(II)的吸附量在温度从20℃升高到50℃时增加。Langmuir和Freundlich吸附等温线的相关系数(R2)分别为0.9268和0.9489,Freundlich等温线比Langmuir等温线更适合于γ型氧化铝上的吸附。通过微分床反应器测定了在pH值为6时Ni(II)在γ型氧化铝上的总吸附速率如下:r = 68.77Ce(1.61) - 17.60qe(0.36)。在Ni(II)吸附过程中,溶液中的Al(III)离子远离氧化铝表面,且Al(III)浓度随着氧化铝上Ni(II)吸附量的增加而增加。