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甲硫醇在Ag(110)上的非离解化学吸附:自组装单分子层的一个关键结果。

Nondissociative chemisorption of methanethiol on Ag(110): a critical result for self-assembled monolayers.

作者信息

Lee Jae-Gook, Lee Junseok, Yates John T

机构信息

Surface Science Center, Department of Chemistry, University of Pittsburgh, Pittsburgh, Pennsylvania 15260, USA.

出版信息

J Am Chem Soc. 2004 Jan 21;126(2):440-1. doi: 10.1021/ja030357d.

Abstract

Three definitive experiments have been performed to investigate the possibility of dissociative adsorption of methanethiol (CH3SH) on clean Ag(110). On the clean Ag(110) surface, the adsorption in the first layer occurs to 0.5 ML, producing a (2 x 1) low-energy electron diffraction (LEED) structure. The undissociated molecule desorbs starting at approximately 140 K, and only tiny quantities of other gaseous products are desorbed, and only tiny quantities of S-containing species remain. Using a 50:50% mixture of CH3SD and CD3SH, we find no evidence of S-H or S-D bond scission between these molecules upon desorption. And finally, when the CH3SH molecule is incident on the clean Ag(110) surface in the temperature range of 230-400 K, less than 1% of the incident molecules dissociate to produce adsorbed sulfur-containing species. The results influence our thinking about the surface bonding of alkanethiol-based self-assembled monolayers (SAMs) on noble metals.

摘要

已进行了三项确定性实验,以研究甲硫醇(CH3SH)在清洁的Ag(110)表面上发生解离吸附的可能性。在清洁的Ag(110)表面上,第一层的吸附量达到0.5 ML,产生一种(2 x 1)低能电子衍射(LEED)结构。未解离的分子在大约140 K开始解吸,只有极少量的其他气态产物解吸出来,并只残留极少量的含硫物种。使用CH3SD和CD3SH的50:50%混合物,我们发现在解吸过程中这些分子之间没有S-H或S-D键断裂的证据。最后,当CH3SH分子在230 - 400 K的温度范围内入射到清洁的Ag(110)表面时,不到1%的入射分子发生解离,生成吸附的含硫物种。这些结果影响了我们对基于链烷硫醇的自组装单分子层(SAMs)在贵金属表面键合的认识。

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