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置于电场中的薄液膜间界面的不稳定性。

Instability of the interface between thin fluid films subjected to electric fields.

作者信息

Shankar V, Sharma Ashutosh

机构信息

Department of Chemical Engineering, Indian Institute of Technology, Kanpur 208016, India.

出版信息

J Colloid Interface Sci. 2004 Jun 1;274(1):294-308. doi: 10.1016/j.jcis.2003.12.024.

Abstract

The effect of an externally applied electric field on the stability of the interface between two thin leaky dielectric fluid films of thickness ratio and viscosity ratio ris analyzed using a linear stability analysis in the long-wave limit. A systematic asymptotic expansion is employed in this limit to derive the coupled nonlinear differential equations describing the evolution of the position of the interface between the fluids and the interfacial free charge distribution. The linearized stability of these equations is determined and the effect of the ratio of the conductivities, dielectric constants, thicknesses, and viscosities on the wavenumber of the fastest growing mode, kmax, and the growth rate of the most unstable mode, smax, is examined in detail. Specific configurations considered in previous studies, such as a perfect dielectric-air interface, leaky dielectric-air interface, etc., emerge as limiting cases from the general formulation developed in this paper. Our results show that the viscosity ratio, mur, does not have any significant effect on kmax for the interface between perfect and leaky dielectric fluids. In marked contrast, however, mur is shown to have a significant effect on the interface between two leaky dielectrics. Increasing mur from 0.1 to 10 could decrease kmax up to a factor of 5. In general, our results show that the presence of nonzero conductivity in either one or both of the fluids has a profound influence on the length-scale characteristic of the linear instability: a reduction even by a factor of 1/50 in the length scale can be effected when compared to the interface between two perfect dielectrics. These predictions could have important implications in pattern formation applications in thin fluid films that employ electric fields. The variation of kmax and smax on the thickness ratio, beta, indicates in general that kmaxalpha(beta-apha), and smaxalpha(beta-theta), where the exponents alpha and theta (both >0) are found to depend only on the ratio of conductivities, and are largely independent of other system parameters.

摘要

利用长波极限下的线性稳定性分析,研究了外部施加电场对厚度比和粘度比为r的两个薄漏电介质流体薄膜之间界面稳定性的影响。在此极限下采用系统的渐近展开来推导描述流体间界面位置演变和界面自由电荷分布的耦合非线性微分方程。确定了这些方程的线性化稳定性,并详细研究了电导率比、介电常数比、厚度比和粘度比对最快增长模式的波数kmax和最不稳定模式的增长率smax的影响。先前研究中考虑的特定构型,如理想电介质-空气界面、漏电电介质-空气界面等,作为本文所发展的一般公式的极限情况出现。我们的结果表明,对于理想电介质和漏电电介质流体之间的界面,粘度比mur对kmax没有显著影响。然而,与之形成鲜明对比的是,mur对两个漏电电介质之间的界面有显著影响。将mur从0.1增加到10可使kmax降低至五分之一。一般来说,我们的结果表明,一种或两种流体中存在非零电导率对线性不稳定性的长度尺度特性有深远影响:与两个理想电介质之间的界面相比,长度尺度甚至可以降低至五十分之一。这些预测可能对采用电场的薄流体薄膜中的图案形成应用具有重要意义。kmax和smax随厚度比β的变化总体表明,kmax∝(β-α),smax∝(β-θ),其中指数α和θ(均>0)仅取决于电导率比,并且在很大程度上与其他系统参数无关。

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