Nakamura Tohru, Miyamae Takayuki, Nakai Ikuyo, Kondoh Hiroshi, Kawamoto Tohru, Kobayashi Nobuhiko, Yasuda Satoshi, Yoshimura Daisuke, Ohta Toshiaki, Nozoye Hisakazu, Matsumoto Mutsuyoshi
Nanotechnology Research Institute (NRI), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5-2, 1-1 Higashi, 1-Chome, Tsukuba 305-8565, Japan.
Langmuir. 2005 Apr 12;21(8):3344-53. doi: 10.1021/la047620o.
Organic ditellurides (R2Te2 where R = n-butyl (C4), n-octyl (C8), and n-cetyl (C16)) were synthesized, and their adsorption states after oxidation on Au(111) surfaces were studied by X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), theoretical analyses, near-edge X-ray absorption fine structure (NEXAFS) measurements, contact angle measurements, and atomic force microscopy (AFM). The obtained results show that dialkyl ditellurides form autooxidized monolayers (AMs) on the surfaces under ambient conditions and that the oxidation process is accelerated by ambient light. XPS, UPS, and theoretical analyses suggest that the autooxidized ditelluride species consist of polymers or oligomers with Te-O-Te-O network structures stabilized by oxygen bridges between tellurium molecules following the cleavage of tellurium-gold bonds. NEXAFS and contact angle measurements indicate that the average tilt angles of the alkyl chains from the surface normal are smaller for the AMs of dialkyl ditellurides having longer alkyl chains. AFM measurements show defects and roughness features around a few angstroms in height on the surfaces of the dialkyl ditelluride AMs.
合成了有机二碲化物(R2Te2,其中R = 正丁基(C4)、正辛基(C8)和正十六烷基(C16)),并通过X射线光电子能谱(XPS)、紫外光电子能谱(UPS)、理论分析、近边X射线吸收精细结构(NEXAFS)测量、接触角测量和原子力显微镜(AFM)研究了它们在Au(111)表面氧化后的吸附状态。所得结果表明,二烷基二碲化物在环境条件下在表面形成自氧化单层(AM),并且氧化过程因环境光而加速。XPS、UPS和理论分析表明,自氧化二碲化物物种由聚合物或低聚物组成,其具有Te-O-Te-O网络结构,在碲-金键断裂后由碲分子之间的氧桥稳定。NEXAFS和接触角测量表明,对于具有较长烷基链的二烷基二碲化物的AM,烷基链相对于表面法线的平均倾斜角较小。AFM测量显示二烷基二碲化物AM表面存在高度约为几埃的缺陷和粗糙度特征。