Yang Guohua, Amro Nabil A, Starkewolfe Zane B, Liu Gang-Yu
Department of Chemistry, University of California, Davis, California 95616, USA.
Langmuir. 2004 May 11;20(10):3995-4003. doi: 10.1021/la0499160.
A molecular-level approach is developed to prevent or inhibit the degradation processes of alkanethiol self-assembled monolayers (SAMs). Previous studies revealed two degradation pathways: direct desorption and oxidation-desorption. By use of scanning tunneling microscopy (STM) and atomic force microscopy (AFM), in situ and time-dependent imaging reveals and confirms that degradations of alkanethiol SAMs on gold mainly initiate at defect sites, such as domain boundaries and vacancy islands, and then propagate into the ordered domains. Our approach targets at attaching small molecules with preferred adhesion to the defects. The best candidates are aqueous media containing a small amount of amphiphilic surfactant molecules, such as N,N-dimethylformamide (DMF) or dimethyl sulfoxide (DMSO). High-resolution studies demonstrate that DMSO and DMF molecules attach to SAM surfaces and more favorably at defect sites, forming relatively stable adsorbates. This attachment increases the activation energy sufficiently to inhibit both degradation pathways. The robustness of this approach has been investigated as a function of surfactant concentration, solution temperature, and the stirring condition. Molecular-level mechanisms and energetics for degradation inhibition of SAMs are also discussed in detail.
一种分子水平的方法被开发出来以防止或抑制链烷硫醇自组装单分子层(SAMs)的降解过程。先前的研究揭示了两种降解途径:直接解吸和氧化解吸。通过使用扫描隧道显微镜(STM)和原子力显微镜(AFM),原位和随时间变化的成像揭示并证实了金表面链烷硫醇SAMs的降解主要在缺陷部位开始,如畴界和空位岛,然后扩展到有序畴。我们的方法旨在将具有优先附着力的小分子附着到缺陷上。最佳候选物是含有少量两亲性表面活性剂分子的水性介质,如N,N - 二甲基甲酰胺(DMF)或二甲基亚砜(DMSO)。高分辨率研究表明,DMSO和DMF分子附着在SAM表面,并且在缺陷部位更有利,形成相对稳定的吸附物。这种附着充分增加了活化能以抑制两种降解途径。该方法的稳健性已作为表面活性剂浓度、溶液温度和搅拌条件的函数进行了研究。还详细讨论了SAMs降解抑制的分子水平机制和能量学。