Taboada-Serrano Patricia, Vithayaveroj Viriya, Yiacoumi Sotira, Tsouris Costas
School of Civil and Environmental Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332-0512, USA.
Environ Sci Technol. 2005 Sep 1;39(17):6352-60. doi: 10.1021/es050100a.
Unfavorable aggregation and deposition of colloidal particles in natural and engineered systems is still a subject of debate. Complicating factors such as surface roughness, secondary minimum aggregation, and the nature of discrete surface charge and surface potential make it difficult to attribute a specific cause to these phenomena. The presence of surface charge heterogeneity and its influence on interaction forces, which are responsible for aggregation and deposition, are studied in this work through the application of atomic force microscopy (AFM). Force-volume-mode AFM was used to map interaction forces on a surface and relate them to surface charge heterogeneities. The experimental system consisted of a silica plate and a standard silicon nitride AFM tip. Copper ions were used for sorption on the silica surface in order to modify the surface charge and cause charge reversal. Different concentrations of copper ions were selected to identify conditions of partial coverage of the silica surface. The pH and ionic strength of the solutions were varied, and the extension of the surface charge modification and its influence on the resulting interaction forces were monitored via AFM force measurements. Depending on the pH and ionic strength, the interaction force was found to change at certain regions on the surface from attraction to either weak or strong repulsion. Force imaging allowed the visual localization of zones of strong repulsive interaction that diminished in size with increasing ionic strength. X-ray photoelectron spectroscopy analysis was used to confirm the presence of copper on the surface. Local charge differences on a surface result in local differences in surface forces, not only in magnitude but also in direction. This behavior may explain the aggregation, deposition, and transport of colloidal particles under unfavorable chemical conditions.
在自然和工程系统中,胶体颗粒的不良聚集和沉积仍是一个有争议的话题。诸如表面粗糙度、二级最小聚集以及离散表面电荷和表面电位的性质等复杂因素,使得难以将这些现象归因于某一特定原因。在这项工作中,通过应用原子力显微镜(AFM)研究了表面电荷异质性的存在及其对负责聚集和沉积的相互作用力的影响。力体积模式原子力显微镜用于绘制表面上的相互作用力,并将它们与表面电荷异质性联系起来。实验系统由一块二氧化硅板和一个标准氮化硅原子力显微镜探针组成。使用铜离子吸附在二氧化硅表面,以改变表面电荷并导致电荷反转。选择不同浓度的铜离子以确定二氧化硅表面部分覆盖的条件。改变溶液的pH值和离子强度,并通过原子力显微镜力测量监测表面电荷改性的程度及其对产生的相互作用力的影响。根据pH值和离子强度,发现表面某些区域的相互作用力从吸引力变为弱排斥力或强排斥力。力成像允许对强排斥相互作用区域进行视觉定位,这些区域的大小随着离子强度的增加而减小。X射线光电子能谱分析用于确认表面铜的存在。表面上的局部电荷差异不仅会导致表面力在大小上,而且会在方向上产生局部差异。这种行为可能解释了在不利化学条件下胶体颗粒的聚集、沉积和传输。