Andersson Karin M, Bergström Lennart
YKI, Institute for Surface Chemistry, Box 5607, SE-114 86 Stockholm, Sweden.
J Colloid Interface Sci. 2002 Feb 15;246(2):309-15. doi: 10.1006/jcis.2001.8021.
We have investigated the DLVO surface forces of oxidized tungsten and cobalt surfaces using the atomic force microscope (AFM) colloidal probe technique. It was shown by X-ray photoelectron spectroscopy (XPS) and electrokinetic measurements that this model system is representative of industrial tungsten carbide (WC) and cobalt powders used in the production of hard metals. We found that the attractive van der Waals forces are well described by Hamaker constants, calculated from optical data for WO(3) and CoOOH. The repulsive electrostatic double layer forces between WO(3) surfaces increase with increasing pH due to an increasingly negative surface potential. This surface potential decreases with increasing ionic strength at pH 7.5. The electrostatic interaction between WO(3) and CoOOH is attractive at pH 10, suggesting a positively charged CoOOH surface.
我们使用原子力显微镜(AFM)胶体探针技术研究了氧化钨和钴表面的DLVO表面力。X射线光电子能谱(XPS)和电动测量表明,该模型系统代表了用于生产硬质合金的工业碳化钨(WC)和钴粉末。我们发现,由WO(3)和CoOOH的光学数据计算得出的哈梅克常数能很好地描述吸引力范德华力。由于表面电位越来越负,WO(3)表面之间的排斥性静电双层力随pH值升高而增加。在pH 7.5时,该表面电位随离子强度增加而降低。在pH 10时,WO(3)和CoOOH之间的静电相互作用具有吸引力,表明CoOOH表面带正电。