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通过脉冲激光沉积在MgO(001)上沉积的Pt层随沉积参数的演变:扫描隧道显微镜和能量色散X射线衍射/反射测量研究

Evolution of the Pt layer deposited on MgO(001) by pulsed laser deposition as a function of the deposition parameters: a scanning tunneling microscopy and energy dispersive X-ray diffractometry/reflectometry study.

作者信息

Scavia Guido, Agostinelli Elisabetta, Laureti Sara, Varvaro Gaspare, Paci Barbara, Generosi Amanda, Albertini Valerio Rossi, Kaciulis Saulius, Mezzi Alessio

机构信息

Area di Ricerca ROMA 1, Istituto di Struttura della Materia, CNR, via Salaria km 29.500, 00016 Monterotondo Scalo, Roma, Italy.

出版信息

J Phys Chem B. 2006 Mar 23;110(11):5529-36. doi: 10.1021/jp0554644.

Abstract

A combined ultrahigh vacuum scanning tunneling microscopy (STM-UHV) and energy dispersive X-ray diffractometry/reflectometry (EDXD/EDXR) study of the evolution of face-centered cubic (fcc) Pt layer growth on MgO(100) by pulsed laser deposition as a function of the process parameters such as deposition temperature and deposition duration has been carried out. The aim of this study is to define the best experimental conditions to obtain a controlled film deposition selective on the Pt growth direction (either [111] or [002]). The evolution of the Pt surface morphology as a function of the deposition temperature (T(dep)) from 300 to 700 degrees C has been studied with STM and ED techniques. Results show that the Pt surface, characterized at T(dep) = 300 degrees C by a 3D island morphology, evolves at higher temperatures to a morphology in which the original islands coexist with a distribution of orthogonal 2D stripes. The two features can be associated with the [111] and [002] Pt growth directions of the fcc phase, respectively. For T(dep) = 700 degrees C, the island morphology of the (111) face completely disappears, while the merging process of the (002) stripes reaches completion. The evolution of the morphology at T(dep) = 600 degrees C as a function of the deposition time and thickness has then been studied with STM-UHV, revealing an initial growth of mosaic-like 3D islands. These independent islands, already interconnected, expand along two orthogonal directions and, for longer deposition times, lead to the texture of orthogonal stripes. The EDXR characterization providing the morphological parameters of the films, i.e., thickness and roughness, confirms the above observation and quantifies the effect of such morphological changes on the surface roughness of the Pt film, an important parameter for applications of Pt films as underlayer in magnetic recording media.

摘要

通过脉冲激光沉积,利用超高真空扫描隧道显微镜(STM-UHV)和能量色散X射线衍射/反射测量法(EDXD/EDXR)相结合,研究了面心立方(fcc)铂层在MgO(100)上的生长演变与诸如沉积温度和沉积持续时间等工艺参数的关系。本研究的目的是确定最佳实验条件,以实现对铂生长方向([111]或[002])具有选择性的可控薄膜沉积。利用STM和ED技术研究了铂表面形貌随沉积温度(T(dep))从300℃到700℃的变化。结果表明,在T(dep)=300℃时,铂表面具有三维岛状形貌,在较高温度下演变为一种形貌,其中原始岛与正交二维条纹分布共存。这两个特征分别与fcc相的[111]和[002]铂生长方向相关。对于T(dep)=700℃,(111)面的岛状形貌完全消失,而(002)条纹的合并过程完成。然后利用STM-UHV研究了T(dep)=600℃时形貌随沉积时间和厚度的变化,揭示了类似镶嵌的三维岛的初始生长。这些已经相互连接的独立岛沿着两个正交方向扩展,对于更长的沉积时间,会形成正交条纹的织构。提供薄膜形态参数(即厚度和粗糙度)的EDXR表征证实了上述观察结果,并量化了这种形态变化对铂薄膜表面粗糙度的影响,铂薄膜作为磁记录介质底层的应用中,表面粗糙度是一个重要参数。

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