Lawrence Jennifer R, Glass Samuel V, Park Seong-Chan, Nathanson Gilbert M
Department of Chemistry, University of Wisconsin-Madison, 1101 University Avenue, Madison, Wisconsin 53706, USA.
J Phys Chem A. 2005 Aug 25;109(33):7458-65. doi: 10.1021/jp0500438.
The entry of HCl into 60-68 wt % D(2)SO(4) and HBr into 68 wt % acid containing 0-0.18 M 1-butanol was monitored by measuring the fractions of impinging HCl and HBr molecules that desorb as DCl and DBr after undergoing H --> D exchange within the deuterated acid. The addition of 0.18 M butanol to the acid creates butyl films that reach approximately 80% surface coverage at 213 K. Surprisingly, this butyl film does not impede exchange but instead enhances it: the HCl --> DCl exchange fractions increase from 0.52 to 0.74 for 60 wt % D(2)SO(4) and from 0.14 to 0.27 for 68 wt % D(2)SO(4). HBr --> DBr exchange increases even more sharply, rising from 0.22 to 0.65 for 68 wt % D(2)SO(4). We demonstrate that this enhanced exchange corresponds to enhanced uptake into the butyl-coated acid for HBr and infer this equivalence for HCl. In contrast, the entry probability of the basic molecule CF(3)CH(2)OH exceeds 0.85 at all acid concentrations and is only slightly diminished by the butyl film. The OD groups of surface butanol molecules may assist entry by providing extra interfacial protonation sites for HCl and HBr dissociation. The experiments suggest that short-chain surfactants in sulfuric acid aerosols do not hinder heterogeneous reactions of HCl or HBr with other solute species.
通过测量撞击的HCl和HBr分子在氘代酸中进行H→D交换后以DCl和DBr形式解吸的比例,监测HCl进入60 - 68 wt% D₂SO₄以及HBr进入含0 - 0.18 M正丁醇的68 wt%酸中的情况。向酸中添加0.18 M丁醇会形成丁基膜,在213 K时表面覆盖率达到约80%。令人惊讶的是,这种丁基膜并不阻碍交换,反而增强了交换:对于60 wt% D₂SO₄,HCl→DCl交换比例从0.52增加到0.74,对于68 wt% D₂SO₄,从0.14增加到0.27。HBr→DBr交换增加得更为显著,对于68 wt% D₂SO₄,从0.22增加到0.65。我们证明这种增强的交换对应于HBr在丁基包覆的酸中摄取的增强,并推断HCl也存在这种等效关系。相比之下,碱性分子CF₃CH₂OH在所有酸浓度下的进入概率都超过0.85,并且仅被丁基膜略微降低。表面丁醇分子的OD基团可能通过为HCl和HBr解离提供额外的界面质子化位点来协助进入。实验表明,硫酸气溶胶中的短链表面活性剂不会阻碍HCl或HBr与其他溶质物种的非均相反应。