Quiles María José
Departamento de Biología Vegetal, Facultad de Biología, Universidad de Murcia, Spain.
Plant Cell Environ. 2006 Aug;29(8):1463-70. doi: 10.1111/j.1365-3040.2006.01510.x.
High irradiance and moderate heat inhibit the activity of the photosynthetic apparatus of oat (Avena sativa L.) leaves. The incubation of oat leaves under high light intensity in conjunction with high temperatures strongly decreased the maximal quantum yield of photosystem (PS) II, indicating the close synergistic effect of both stress factors on PS II inhibition and the subsequent irreversible damage to the photosynthetic apparatus. The PS I A/B protein levels remained similar to control values in leaves incubated under high light intensity or moderate heat, and decreased only when both stress factors were simultaneously applied. Immunoblot analysis of thylakoid membranes using specific antibodies raised against the NDH-K subunit of the thylakoidal NADH dehydrogenase complex (NADH DH) and against plastid terminal oxidase (PTOX) revealed an increase in the amount of both proteins in response to high light intensity and/or heat treatments. In addition, these stress treatments were seen to stimulate the activity of electron donation by NADPH and ferredoxin to plastoquinone, the PTOX activity in plastoquinone oxidation and the NADH DH activity in thylakoid membranes. Incubation with n-propyl gallate (an inhibitor of PTOX) inhibited the increase of NDH-K and PTOX levels under high light intensity and heat, and slightly stimulated the activity of electron donation by NADPH and ferredoxin to plastoquinone. Antimycin A (an inhibitor of cyclic electron flow) increased the NADH DH activity and preserved the levels of NDH-K and PTOX in thylakoid membranes from leaves incubated under high light intensity and heat. The up-regulation of the PTOX and the thylakoidal NADH DH complex under these stress conditions supports a role for chlororespiration in the protection against high irradiance and moderate heat.
高辐照度和适度高温会抑制燕麦(Avena sativa L.)叶片光合机构的活性。在高光强和高温条件下培养燕麦叶片,会显著降低光系统(PS)II的最大量子产率,这表明这两种胁迫因素对PS II抑制具有密切的协同效应,并随后对光合机构造成不可逆的损害。在高光强或适度高温下培养的叶片中,PS I A/B蛋白水平与对照值相似,只有当两种胁迫因素同时施加时才会降低。使用针对类囊体NADH脱氢酶复合体(NADH DH)的NDH-K亚基和质体末端氧化酶(PTOX)产生的特异性抗体对类囊体膜进行免疫印迹分析,结果显示,响应高光强和/或热处理,这两种蛋白质的含量均有所增加。此外,这些胁迫处理还能刺激NADPH和铁氧还蛋白向质体醌的电子供体活性、质体醌氧化中的PTOX活性以及类囊体膜中的NADH DH活性。用棓丙酯(一种PTOX抑制剂)孵育可抑制高光强和高温下NDH-K和PTOX水平的升高,并略微刺激NADPH和铁氧还蛋白向质体醌的电子供体活性。抗霉素A(一种循环电子流抑制剂)可增加NADH DH活性,并维持高光强和高温下培养的叶片类囊体膜中NDH-K和PTOX的水平。在这些胁迫条件下,PTOX和类囊体NADH DH复合体的上调支持了叶绿体呼吸在抵御高辐照度和适度高温中的作用。