Kim Do Hwan, Jang Yunseok, Park Yeong Don, Cho Kilwon
Department of Chemical Engineering, Polymer Research Institute, Pohang University of Science and Technology, Pohang 790-784, Korea.
J Phys Chem B. 2006 Aug 17;110(32):15763-8. doi: 10.1021/jp062899y.
With the aim of improving the field-effect mobilities in poly(3-hexylthiophene) (P3HT) thin film transistors, we controlled the nanostructures of P3HT thin film by changing the solvent vapor pressure in a spin-coating chamber during solidification. The transistors with P3HT thin films spin-coated under a high solvent vapor pressure (56.5 KPa), showing the one-dimensional nanowire morphologies, resulted in the relatively high field-effect mobilities (0.02 cm2/(V.s)) that are typically more than 1 order of magnitude higher than those prepared under ambient conditions, showing the featureless morphologies. This can be attributed to the higher solvent vapor pressure during film formation, providing the solvent is allowed to evaporate slowly and the degree of ordering within the P3HT crystalline domains is dramatically improved.
为了提高聚(3-己基噻吩)(P3HT)薄膜晶体管的场效应迁移率,我们通过在固化过程中改变旋涂腔中的溶剂蒸气压来控制P3HT薄膜的纳米结构。在高溶剂蒸气压(56.5 KPa)下旋涂P3HT薄膜的晶体管呈现一维纳米线形态,其场效应迁移率相对较高(0.02 cm2/(V·s)),通常比在环境条件下制备的晶体管高1个数量级以上,后者呈现无特征形态。这可归因于成膜过程中较高的溶剂蒸气压,使得溶剂能够缓慢蒸发,并且P3HT结晶域内的有序度得到显著提高。