吲达帕胺所致光甲脱离

Photo-onycholysis due to indapamide.

作者信息

Rutherford Tim, Sinclair Rodney

机构信息

Monash Medical Centre, St Vincent's Hospital Melbourne, Melbourne, Victoria, Australia.

出版信息

Australas J Dermatol. 2007 Feb;48(1):35-6. doi: 10.1111/j.1440-0960.2007.00324.x.

DOI:10.1111/j.1440-0960.2007.00324.x

PMID:17222300

Abstract

Photo-onycholysis due to indapamide presented in a 75-year-old woman who was being treated with the diuretic for hypertension. The onset of her photo-onycholysis was delayed because of inadvertent photoprotection in the form of artificial nails and occurred in the absence of a generalized photosensitive eruption. Her nails returned to normal after withdrawal of the drug and application of opaque nail polish.

摘要

一名75岁女性因服用吲达帕胺治疗高血压而出现光甲脱离。由于人工指甲起到了意外的光保护作用，她的光甲脱离发病延迟，且没有出现全身性光敏性皮疹。停用该药物并涂抹不透明指甲油后，她的指甲恢复了正常。