Sun Choi Ji, Bae Sukjong, Jung Ahn Sang, Hyun Kim Dal, Young Jung Ki, Han Cheolsu, Choo Chung Chung, Lee Haiwon
Department of Chemistry, Hanyang University, Seoul 133-791, Korea.
Ultramicroscopy. 2007 Oct;107(10-11):1091-4. doi: 10.1016/j.ultramic.2007.03.014. Epub 2007 May 18.
Multi-walled carbon nanotube (CNT) tips were used in atomic force microscope (AFM) anodization lithography to investigate their advantages over conventional tips. The CNT tip required a larger threshold voltage than the mother silicon tip due to the Schottky barrier at the CNT-Si interface. Current-to-voltage curves distinguished the junction property between CNTs and mother tips. The CNT-platinum tip, which is more conductive than the CNT-silicon tip, showed promising results for AFM anodization lithography. Finally, the nanostructures with high aspect ratio were fabricated using a pulsed bias voltage technique as well as the CNT tip.
多壁碳纳米管(CNT)尖端被用于原子力显微镜(AFM)阳极氧化光刻技术中,以研究其相较于传统尖端的优势。由于碳纳米管与硅界面处的肖特基势垒,碳纳米管尖端比母硅尖端需要更高的阈值电压。电流-电压曲线区分了碳纳米管与母尖端之间的结特性。比碳纳米管-硅尖端导电性更强的碳纳米管-铂尖端在AFM阳极氧化光刻技术中显示出了良好的效果。最后,使用脉冲偏置电压技术以及碳纳米管尖端制造出了具有高纵横比的纳米结构。