Winn Darby L, Hale Michael J, Grassman Tyler J, Sexton Jonathan Z, Kummel Andrew C, Passlack Matthias, Droopad Ravi
Department of Chemistry and Biochemistry, University of California, San Diego, La Jolla, California 92093, USA.
J Chem Phys. 2007 Oct 7;127(13):134705. doi: 10.1063/1.2786097.
A systematic experimental and theoretical study was performed to determine the causes of oxide-induced Fermi level pinning and unpinning on GaAs(001)-c(2 x 8)/(2 x 4). Scanning tunneling spectroscopy (STS) and density functional theory (DFT) were used to study four different adsorbates' (O(2), In(2)O, Ga(2)O, and SiO) bonding to the GaAs(001)-c(2 x 8)/(2 x 4) surface. The STS results revealed that out of the four adsorbates studied, only one left the Fermi level unpinned, Ga(2)O. DFT calculations were used to elucidate the causes of the Fermi level pinning. Two distinct pinning mechanisms were identified: direct (adsorbate induced states in the band gap region) and indirect pinnings (generation of undimerized As atoms). For O(2) dissociative chemisorption onto GaAs(001)-c(2 x 8)/(2 x 4), the Fermi level pinning was only indirect, while direct Fermi level pinning was observed when In(2)O was deposited on GaAs(001)-c(2 x 8)/(2 x 4). In the case of SiO on GaAs(001)-c(2 x 8)/(2 x 4), the Fermi level pinning was a combination of the two mechanisms.
开展了一项系统的实验和理论研究,以确定在GaAs(001)-c(2×8)/(2×4)上氧化物诱导费米能级钉扎和解钉扎的原因。使用扫描隧道谱(STS)和密度泛函理论(DFT)研究了四种不同吸附质(O(2)、In(2)O、Ga(2)O和SiO)与GaAs(001)-c(2×8)/(2×4)表面的键合情况。STS结果表明,在所研究的四种吸附质中,只有一种使费米能级未被钉扎,即Ga(2)O。DFT计算用于阐明费米能级钉扎的原因。确定了两种不同的钉扎机制:直接(带隙区域中的吸附质诱导态)和间接钉扎(未二聚化的As原子的产生)。对于O(2)在GaAs(001)-c(2×8)/(2×4)上的解离化学吸附,费米能级钉扎仅是间接的,而当In(2)O沉积在GaAs(001)-c(2×8)/(2×4)上时观察到直接费米能级钉扎。在SiO吸附在GaAs(001)-c(2×8)/(2×4)的情况下,费米能级钉扎是两种机制的组合。