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水稻白叶枯病抗性基因Xa10的高分辨率遗传定位

High-resolution genetic mapping of bacterial blight resistance gene Xa10.

作者信息

Gu Keyu, Sangha Jatinder Singh, Li Yin, Yin Zhongchao

机构信息

Temasek Life Sciences Laboratory, 1 Research Link, The National University of Singapore, Singapore 117604, Republic of Singapore.

出版信息

Theor Appl Genet. 2008 Jan;116(2):155-63. doi: 10.1007/s00122-007-0655-5. Epub 2007 Oct 9.

Abstract

Bacterial blight of rice, caused by Xanthomonas oryzae pv. oryzae (Xoo), is the most devastating disease of rice (Oryza sativa L). Rice lines that carry resistance (R) gene Xa10 confer race-specific resistance to Xoo strains harboring avirulence (Avr) gene avrXa10. Here we report on genetic study, disease evaluation and fine genetic mapping of the Xa10 gene. The inheritance of Xa10-mediated resistance to PXO99A(pHM1avrXa10) did not follow typical Mendelian inheritance for single dominant gene in F2 population derived from IR24 x IRBB10. A locus might be present in IRBB10 that caused distorted segregation in F2 population. To eliminate this locus, an F3 population (F3-65) was identified, which showed normal Mendelian segregation ratio of 3:1 for resistance and susceptibility. A new near-isogenic line (F3-65-1743) of Xa10 in IR24 genetic background was developed and designated as IRBB10A. IRBB10A retained similar resistance specificity as that of IRBB10 and provided complete resistance to PXO99A(pHM1avrXa10) from seedling to adult stages. Linkage analysis using existing RFLP markers and F2 mapping population mapped the Xa10 locus to the proximal side of E1981S with genetic distance at 0.93 cM. With five new RFLP markers developed from the genomic sequence of Nipponbare, Xa10 was finely mapped at genetic distance of 0.28 cM between proximal marker M491 and distal marker M419 and co-segregated with markers S723 and M604. The physical distance between M491 and M419 on Nipponbare genome is 74 kb. Seven genes have been annotated from this 74-kb region and six of them are possible Xa10 candidates. The results of this study will be useful in Xa10 cloning and marker-assisted breeding.

摘要

由稻黄单胞菌稻致病变种(Xoo)引起的水稻白叶枯病,是水稻(Oryza sativa L)最具毁灭性的病害。携带抗性(R)基因Xa10的水稻品系对携带无毒(Avr)基因avrXa10的Xoo菌株具有小种特异性抗性。本文报道了Xa10基因的遗传研究、病害评估及精细遗传定位。在由IR24与IRBB10杂交衍生的F2群体中,Xa10介导的对PXO99A(pHM1avrXa10)的抗性遗传并不遵循单显性基因典型的孟德尔遗传模式。IRBB10中可能存在一个位点,导致F2群体中出现分离扭曲现象。为消除该位点,鉴定出一个F3群体(F3 - 65),其抗性和感病性的孟德尔分离比正常为3:1。在IR24遗传背景下培育出一个新的Xa10近等基因系(F3 - 65 - 1743),并命名为IRBB10A。IRBB10A保留了与IRBB10相似的抗性特异性,且从苗期到成株期对PXO99A(pHM1avrXa10)均表现出完全抗性。利用现有的RFLP标记和F2定位群体进行连锁分析,将Xa10位点定位到E1981S近端,遗传距离为0.93 cM。利用从日本晴基因组序列开发的5个新的RFLP标记,将Xa10精细定位在近端标记M491和远端标记M419之间,遗传距离为0.28 cM,并与标记S723和M604共分离。在日本晴基因组上,M491和M419之间的物理距离为74 kb。从这74 kb区域已注释出7个基因,其中6个可能是Xa10的候选基因。本研究结果将有助于Xa10的克隆和分子标记辅助育种。

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