Hennies F, Föhlisch A, Wurth W, Feulner P, Fink A, Menzel D
Institut für Experimentalphysik, Universität Hamburg, Luruper Chaussee 149, 22761 Hamburg, Germany.
J Chem Phys. 2007 Oct 21;127(15):154709. doi: 10.1063/1.2789421.
Using high resolution S 2p and O 1s x-ray photoelectron spectroscopies, the adsorption of SO2 and its surface bound reaction products on Ru(0001) have been investigated simultaneously while dosing SO2 and while heating the adsorbed species. SO2 is found to adsorb on Ru(0001) at 100 K molecularly in two variants as well as dissociatively and to react to SO3, SO4, SO, and S with increasing coverage. After the monolayer has been saturated, SO2 adsorbs molecularly in multilayers. When heating adsorbed SO2 from 100 K, SO, SO2, and SO4 decompose in a wide temperature range up to 305 K. In contrast SO3 is found to be stable bound to Ru(0001) up to 300 K and to disappear from the surface to below 325 K. At 550 K the surface remains with a saturated atomic sulfur and oxygen layer and some sulfur species in a second layer. Our quantitative analysis of the sulfur amount bound to the surface supports a simple desorption process only for SO4. All other species mainly or partly decompose on the surface.
利用高分辨率S 2p和O 1s X射线光电子能谱,在通入SO₂以及加热吸附物种的过程中,同时研究了SO₂及其表面结合反应产物在Ru(0001)上的吸附情况。发现SO₂在100 K时以两种变体分子形式以及解离形式吸附在Ru(0001)上,并随着覆盖度增加反应生成SO₃、SO₄、SO和S。单层饱和后,SO₂以分子形式多层吸附。当从100 K加热吸附的SO₂时,SO、SO₂和SO₄在高达305 K的较宽温度范围内分解。相比之下,发现SO₃在高达300 K时稳定地结合在Ru(0001)上,在325 K以下从表面消失。在550 K时,表面残留有饱和的原子硫和氧层以及第二层中的一些硫物种。我们对表面结合硫量的定量分析表明,仅SO₄存在简单的解吸过程。所有其他物种主要或部分在表面分解。