Miyata Yasuo, Terayama Miki, Minari Takeo, Nishinaga Tohru, Nemoto Takashi, Isoda Seiji, Komatsu Koichi
Institute for Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan.
Chem Asian J. 2007 Dec 3;2(12):1492-504. doi: 10.1002/asia.200700254.
Oligo(thienylfuran)s with thiophene rings at both ends (SOSOSOS, DE-SOSOS, DH-SOSOS, DE-SOSOSOS, and DH-SOSOSOS; S and O denote thiophene and furan rings, respectively, DE and DH denote diethyl- and dihexyl-substituted, respectively) were newly synthesized by repetitive Stille coupling reactions. The UV/Vis maximum absorptions of the oligomers, SO, SOSO, SOSOS, SOSOSO, and SOSOSOS, exhibited a clear bathochromic shift with increasing number of heterocycles. The value of the oxidation peak potential (E(pa)1) determined by cyclic voltammetry decreased with an increase in the number of heterocycles by 0.06-0.08 V per heterocycle. The crystal-packing structures of DE-SOSOS and DH-SOSOS determined by X-ray crystallography have a herringbone motif and are denser than the reported structures of pentacene and alpha-sexithiophene. The morphologies of thin films prepared by vacuum deposition and spin coating were investigated by atomic force microscopy and X-ray diffraction. Among these films, those of DE-SOSOS and DH-SOSOS exhibited highly ordered arrangements. The devices based on vacuum-deposited and spin-coated films of DE-SOSOS and DH-SOSOS displayed the highest FET mobilities of 10(-2)-10(-3) cm2 V(-1) s(-1) among the oligomers reported in this study.
通过重复的Stille偶联反应新合成了两端带有噻吩环的低聚(噻吩基呋喃)(SOSOSOS、DE-SOSOS、DH-SOSOS、DE-SOSOSOS和DH-SOSOSOS;S和O分别表示噻吩环和呋喃环,DE和DH分别表示二乙基和二己基取代)。低聚物SO、SOSO、SOSOS、SOSOSO和SOSOSOS的紫外/可见最大吸收随着杂环数量的增加呈现出明显的红移。通过循环伏安法测定的氧化峰电位(E(pa)1)值随着杂环数量的增加每增加一个杂环下降0.06 - 0.08 V。通过X射线晶体学确定的DE-SOSOS和DH-SOSOS的晶体堆积结构具有人字形图案,并且比报道的并五苯和α-六噻吩的结构更致密。通过原子力显微镜和X射线衍射研究了通过真空沉积和旋涂制备的薄膜的形态。在这些薄膜中,DE-SOSOS和DH-SOSOS的薄膜表现出高度有序的排列。基于DE-SOSOS和DH-SOSOS的真空沉积和旋涂薄膜的器件在本研究报道的低聚物中显示出最高的场效应晶体管迁移率,为10(-2)-10(-3) cm2 V(-1) s(-1) 。