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通过H-GaCl₂对碳碳三键进行双重氢镓化反应——螯合路易斯酸的合成及其在加合物形成中的应用

Twofold hydrogallation of C triple bonds c triple bonds by H-GaCl(2)-synthesis of chelating Lewis acids and their application in adduct formation.

作者信息

Uhl Werner, Claesener Michael

机构信息

Institut für Anorganische und Analytische Chemie der Universität Münster, Corrensstrasse 30, D-48149 Münster, Germany.

出版信息

Inorg Chem. 2008 Jan 21;47(2):729-35. doi: 10.1021/ic701928s. Epub 2007 Dec 15.

Abstract

The twofold addition of Ga-H to Ctriple bonds C triple bonds (hydrogallation) did not succeed by treatment of alkynes with an excess of dialkylgallium hydrides. In contrast, double hydrogallation was easily achieved by the reactions of H-GaCl(2) with trimethylsilyl-substituted alkynes [trimethylsilylphenylethyne and 1,4-bis(trimethylsilylethynyl)benzene] in appropriate stoichiometric ratios. The monoalkyne yielded the compound H(5)C(6)-CH(2)-C(SiMe(3))(GaCl(2))(2), 1, which was only sparingly soluble in n-hexane. Crystal structure determination revealed a dimeric formula unit possessing two parallel Ga(2)Cl(2) heterocycles in the solid state. Treatment of the dialkyne with four equivalents of the hydride gave a colorless precipitate, which was completely insoluble in hydrocarbons. Addition of diethyl ether to both products afforded soluble and monomeric etherates 1(OEt(2))(2) and 2 in which the two or four gallium atoms, respectively, were coordinated by ether molecules. Preliminary experiments with simple Lewis bases showed the principle capability of 1 to act as an effective chelating Lewis acid. Adducts of the type [H(5)C(6)-CH(2)-C(SiMe(3))(GaCl(2))(GaClX)(micro-Cl)]- (4-6) resulted upon treatment with halide ions (X = Cl, Br, I).

摘要

用过量的二烷基氢化镓处理炔烃,使Ga - H对碳碳三键进行两次加成(氢镓化反应)未成功。相反,通过H - GaCl₂与三甲基硅基取代的炔烃[三甲基硅基苯乙炔和1,4 - 双(三甲基硅基乙炔基)苯]按适当化学计量比反应,很容易实现双氢镓化反应。单炔烃生成化合物[H₅C₆ - CH₂ - C(SiMe₃)(GaCl₂)₂]₂,即1,它在正己烷中仅微溶。晶体结构测定表明,固态时其分子式单元为二聚体,具有两个平行的Ga₂Cl₂杂环。用四当量的氢化物处理二炔烃得到一种无色沉淀,它完全不溶于烃类。向两种产物中加入乙醚得到可溶的单体醚合物1(OEt₂)₂和2,其中两个或四个镓原子分别与醚分子配位。用简单路易斯碱进行的初步实验表明,1具有作为有效螯合路易斯酸的基本能力。用卤离子(X = Cl、Br、I)处理后得到[H₅C₆ - CH₂ - C(SiMe₃)(GaCl₂)(GaClX)(μ - Cl)] - (4 - 6)类型的加合物。

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