Sutow Elliott J, Taylor James C, Maillet Wayne A, Hall Gordon C, Millar Michele
Department of Applied Oral Sciences, Faculty of Dentistry, Dalhousie University, 5981 University Avenue, Halifax, Nova Scotia, Canada B3H 3J5.
Dent Mater. 2008 Jul;24(7):874-9. doi: 10.1016/j.dental.2007.11.002. Epub 2008 Feb 21.
Avoiding the placement of amalgam and noble metal restorations in interproximal contact is recommended due to anticipated galvanic corrosion of the amalgam. There is a similar concern for amalgam/amalgam galvanic couples. It was the objective of this study to determine if an electrically insulating layer forms in the contact area of these galvanic couples. The existence of an electrically insulating layer, which could reduce the galvanic corrosion rate, would be indicated by different corrosion potentials for the two restorations of the couple.
Using a convenience sample of 158 human subjects, corrosion potentials were measured on each restoration of three types of galvanic couples: amalgam/noble metal (n=8), amalgam/amalgam (n=93) and noble metal/noble metal (n=7). Measurements were made with a Ag/AgCl micro-reference electrode and a high impedance voltmeter. All restorations were at least 6 months old.
Statistical analysis showed that the mean absolute corrosion potential differences and the simultaneous confidence intervals of the couples were, respectively, amalgam/noble metal: 62 (31)mV and (27, 99)mV, amalgam/amalgam: 11 (14)mV and (7, 15)mV and noble metal/noble metal: 7 (10)mV and (0, 19)mV.
The amalgam/noble metal couples had consistent and mostly large corrosion potential differences between their restorations, which indicated the presence of an electrically insulating layer. An electrically insulating layer was also indicated for the amalgam/amalgam and noble metal/noble metal couples. The layer is probably composed of non-metallic corrosion products, biofilms, and possibly, dental calculus, which could reduce galvanic corrosion rates to small or negligible values.
由于预计汞合金会发生电偶腐蚀,因此建议避免在邻面接触处放置汞合金和贵金属修复体。对于汞合金/汞合金电偶也存在类似的担忧。本研究的目的是确定在这些电偶的接触区域是否形成电绝缘层。电绝缘层的存在可以降低电偶腐蚀速率,这将通过电偶中两个修复体不同的腐蚀电位来表明。
使用158名人类受试者的便利样本,对三种类型电偶的每个修复体测量腐蚀电位:汞合金/贵金属(n = 8)、汞合金/汞合金(n = 93)和贵金属/贵金属(n = 7)。使用Ag/AgCl微参比电极和高阻抗电压表进行测量。所有修复体至少使用了6个月。
统计分析表明,电偶的平均绝对腐蚀电位差和同时置信区间分别为:汞合金/贵金属:62(31)mV和(27,99)mV,汞合金/汞合金:11(14)mV和(7,15)mV,贵金属/贵金属:7(10)mV和(0,19)mV。
汞合金/贵金属电偶的修复体之间存在一致且大多较大的腐蚀电位差,这表明存在电绝缘层。汞合金/汞合金和贵金属/贵金属电偶也表明存在电绝缘层。该层可能由非金属腐蚀产物、生物膜以及可能的牙石组成,这可以将电偶腐蚀速率降低到很小或可忽略不计的值。