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采用原位脉冲喷射沉积-扫描隧道显微镜技术在Cu(111)清洁表面放置并成像单个碳纳米管。

Placing and imaging individual carbon nanotubes on Cu(111) clean surface using in situ pulsed-jet deposition-STM technique.

作者信息

Fukui Nobuyuki, Taninaka Atsushi, Sugai Toshiki, Yoshida Hiromichi, Heike Seiji, Fujimori Masaaki, Terada Yasuhiko, Hashizume Tomihiro, Shinohara Hisanori

机构信息

Department of Chemistry, Nagoya University, Nagoya 464-8602, Japan.

出版信息

J Nanosci Nanotechnol. 2007 Dec;7(12):4267-71.

Abstract

We report pulsed-jet deposition of single-wall and double-wall carbon nanotubes (SWNTs and DWNTs; CNTs) onto a clean Cu(111) surface and their scanning tunneling microscopy (STM) observations under ultra-high vacuum (UHV). The clean Cu(111) surface prepared by a repeated Ar-sputtering and annealing is introduced into a load-lock chamber kept at a 10(-5)-Pa range vacuum, and the CNTs dispersed in a chloroform solution by ultrasonication are pulse-injected onto the surface. Since the substrate is annealed at 700 K to remove the residual solvent molecules, high resolution lattice images of the CNTs are successfully observed by STM. High-resolution chirality-resolved images of the two SWNTs with a metal cluster are also observed, supporting the well accepted growth mechanism of the CNTs from the metal-catalyst cluster. The present pulsed-jet deposition in high-vacuum is superior to the conventional spin-coating or drop-coating techniques for preparing clean and well-defined CNTs on clean surfaces for high-resolution and contamination-free UHV-STM observation.

摘要

我们报道了将单壁和双壁碳纳米管(SWNTs和DWNTs;统称CNTs)通过脉冲喷射沉积到清洁的Cu(111)表面,并在超高真空(UHV)下对其进行扫描隧道显微镜(STM)观察。通过重复氩溅射和退火制备的清洁Cu(111)表面被引入到保持在10⁻⁵ Pa真空范围的气闸室中,通过超声分散在氯仿溶液中的碳纳米管被脉冲注入到该表面上。由于将衬底在700 K下退火以去除残留的溶剂分子,因此通过STM成功观察到了碳纳米管的高分辨率晶格图像。还观察到了两个带有金属簇的单壁碳纳米管的高分辨率手性分辨图像,这支持了碳纳米管从金属催化剂簇生长的广泛接受的生长机制。当前在高真空下进行的脉冲喷射沉积优于传统的旋涂或滴涂技术,可用于在清洁表面上制备清洁且定义明确的碳纳米管以进行高分辨率和无污染物的超高真空STM观察。

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