McGuiggan Patricia M
Department of Materials Science and Engineering, Johns Hopkins University, Baltimore, MD 21218, USA.
Langmuir. 2008 Apr 15;24(8):3970-6. doi: 10.1021/la703882h. Epub 2008 Mar 15.
Measurements of the contact radius as a function of applied force between a mica surface and a silica surface (mica/silica) in air are reported. The load/unload results show that the contact radius generally increases with applied force. Because of the presence of charging due to contact electrification, both a short-range van der Waals adhesion force and longer-range electrostatic adhesive interaction contribute to the measured force. The results indicate that approximately 20% of the pull-off force is due to van der Waals forces. The contact radius versus applied force results can be fit to Johnson-Kendall-Roberts (JKR) theory by considering that only the short-range van der Waals forces contribute to the work of adhesion and subtracting a constant longer-range electrostatic force. Also, an additional and unexpected step function is superimposed on the contact radius versus applied force curve. Thus, the contact diameter increases in a stepped dependence with increasing force. The stepped contact behavior is seen only for increasing force and is not observed when symmetric mica/mica or silica/silica contacts are measured. In humid conditions, the contact diameter of the mica/silica contact increases monotonically with applied force. Friction forces between the surfaces are also measured and the shear stress of a mica/silica interface is 100 times greater than the shear stress of a mica/mica interface. This large shear stress retards the increase in contact area as the force is increased and leads to the observed stepped contact mechanics behavior.
报告了在空气中云母表面与二氧化硅表面(云母/二氧化硅)之间接触半径随外加力变化的测量结果。加载/卸载结果表明,接触半径通常随外加力的增加而增大。由于接触起电导致的电荷存在,短程范德华粘附力和长程静电粘附相互作用都对测量力有贡献。结果表明,约20%的拉脱力归因于范德华力。通过考虑仅短程范德华力对粘附功有贡献并减去一个恒定的长程静电力,接触半径与外加力的结果可以拟合到约翰逊 - 肯德尔 - 罗伯茨(JKR)理论。此外,在接触半径与外加力曲线上叠加了一个额外的、意想不到的阶跃函数。因此,接触直径随力的增加呈阶梯状依赖关系增大。这种阶梯状接触行为仅在力增加时出现,在测量对称的云母/云母或二氧化硅/二氧化硅接触时未观察到。在潮湿条件下,云母/二氧化硅接触的接触直径随外加力单调增加。还测量了表面之间的摩擦力,云母/二氧化硅界面的剪应力比云母/云母界面的剪应力大100倍。这种大的剪应力随着力的增加阻碍了接触面积的增加,并导致了观察到的阶梯状接触力学行为。