Carrascosa M, Villarroel J, Carnicero J, García-Cabañes A, Cabrera J M
Departamento de Física de Materiales C-IV, Universidad Autónoma de Madrid, E-28049 Madrid, Spain.
Opt Express. 2008 Jan 7;16(1):115-20. doi: 10.1364/oe.16.000115.
The appearance of light intensity thresholds for catastrophic optical damage in LiNbO3 is satisfactorily explained by using a photorefractive model based on the Fe(2+)?Fe(3+) and NbLi(4+)?NbLi(5+) defect pairs. Model simulations of the photorefractive amplification gain as a function of the light intensity present sharp threshold behavior. A similar behavior is shown by the saturating refractive index change. In agreement with experiments, predicted thresholds appear shifted towards higher intensities (up to a 10(4) factor) when the Nb(Li) concentration is decreased or the temperature is increased. The model also explains very recent data on the threshold enhancement with the Fe(2+)/Fe(3+) ratio in optical waveguides.
通过使用基于Fe(2+)?Fe(3+)和NbLi(4+)?NbLi(5+)缺陷对的光折变模型,令人满意地解释了LiNbO3中灾难性光学损伤的光强度阈值的出现。光折变放大增益作为光强度函数的模型模拟呈现出尖锐的阈值行为。饱和折射率变化也表现出类似的行为。与实验一致的是,当Nb(Li)浓度降低或温度升高时,预测的阈值向更高强度移动(高达10^4倍)。该模型还解释了关于光波导中Fe(2+)/Fe(3+)比率导致阈值增强的最新数据。