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互相关效应对粗糙薄膜光学量的影响。

Influence of cross-correlation effects on the optical quantities of rough films.

作者信息

Franta Daniel, Ohlídal Ivan, Necas David

机构信息

Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlárská 2,611 37 Brno, Czech Republic.

出版信息

Opt Express. 2008 May 26;16(11):7789-803. doi: 10.1364/oe.16.007789.

Abstract

Within the Rayleigh-Rice theory the influence of layer boundary roughness on coherently reflected light is expressed using very complex formulae. Therefore we deal with the simplification of these formulae by employing an approximation based on neglecting cross-correlation effects between both the rough boundaries. It is shown that if the mean distance of the boundaries (mean thickness) is sufficiently large in comparison with the lateral dimensions of the roughness it is possible to describe the individual boundaries of the layers by matrices corresponding to isolated rough surfaces. This fact enables us to simplify the formulae for the optical quantities in a substantial way, which also simplifies the numerical calculation needed for the inverse problem. This statement is illustrated by means of a numerical analysis simulating ellipsometric and reflectometric data of rough silicon dioxide layers placed onto silicon single crystal substrates.

摘要

在瑞利 - 莱斯理论中,层边界粗糙度对相干反射光的影响是用非常复杂的公式来表示的。因此,我们通过采用一种基于忽略两个粗糙边界之间互相关效应的近似方法来处理这些公式的简化问题。结果表明,如果边界的平均距离(平均厚度)与粗糙度的横向尺寸相比足够大,那么就可以用对应于孤立粗糙表面的矩阵来描述各层的单个边界。这一事实使我们能够大幅简化光学量的公式,这也简化了反问题所需的数值计算。通过模拟置于硅单晶衬底上的粗糙二氧化硅层的椭偏和反射数据的数值分析对这一表述进行了说明。

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