Henderson Andrew P, Seetohul Lalitesh N, Dean Andrew K, Russell Paul, Pruneanu Stela, Ali Zulfiqur
School of Science and Technology, and Spartan Nano, University of Teesside, Middlesbrough, United Kingdom.
Langmuir. 2009 Jan 20;25(2):931-8. doi: 10.1021/la802677n.
Self-assembled monolayers (SAMs) have numerous applications, for example, engine wear inhibitors, surface profiling signal enhancement, nanostructure production, sensor production, and catalysis. The adsorbed SAM structure has a major impact on the properties of the outer monolayer surface which dictates the performance and viability of the SAM for individual applications. Substrate growth phases of SAMs have been extensively studied, and two structures have been identified. Initially, a lying down SAM structure is formed that evolves into a standing up structure. It is often critical to know how both structures form as a function of substrate immersion time to be able to design the properties of this structure. The formation of mercaptopropionic acid (MPA) SAMs on gold has been studied. Electrochemical impedance spectroscopy (EIS) was used to measure the adsorption isotherms at five temperatures in the range 4-40 degrees C. Infrared reflectance absorption spectroscopy (IRRAS) was also used, and the results show close agreement. A new monolayer adsorption isotherm is proposed which models SAM structure formation as a function of immersion time, representing all phases of SAM adsorption. This model represents a significant improvement on previous models based on Langmuir and Kisliuk adsorption isotherms that only model the fractional coverage of a surface with a SAM. The new model predicts the optimum immersion time taken for an MPA monolayer on gold to attain a surface saturated with MPA. It accounts for temperature effects on the rate of formation and the degree of monolayer disorder. It has potential for use in other SAM systems and may become the method of choice for modeling many instances of sequential substrate adsorption of two different structures, each of which exhibits different properties, as a function of immersion time.
自组装单分子层(SAMs)有众多应用,例如发动机磨损抑制剂、表面轮廓信号增强、纳米结构生产、传感器生产以及催化。吸附的SAM结构对外部单分子层表面的性质有重大影响,而这决定了SAM在各个应用中的性能和可行性。SAMs的基底生长阶段已得到广泛研究,并且已确定了两种结构。最初,会形成一种平躺的SAM结构,该结构会演变成直立结构。了解这两种结构如何随基底浸入时间而形成对于能够设计该结构的性质通常至关重要。已对巯基丙酸(MPA)在金上的SAMs形成进行了研究。使用电化学阻抗谱(EIS)在4 - 40摄氏度范围内的五个温度下测量吸附等温线。还使用了红外反射吸收光谱(IRRAS),结果显示吻合度很高。提出了一种新的单分子层吸附等温线,该等温线将SAM结构形成模拟为浸入时间的函数,代表了SAM吸附的所有阶段。该模型相对于基于朗缪尔和基斯柳克吸附等温线的先前模型有显著改进,后者仅对表面被SAM覆盖的分数进行建模。新模型预测了金上MPA单分子层达到MPA饱和表面所需的最佳浸入时间。它考虑了温度对形成速率和单分子层无序程度的影响。它有潜力用于其他SAM系统,并且可能成为模拟许多情况下两种不同结构的连续基底吸附实例的首选方法,每种结构都表现出不同的性质,且是浸入时间的函数。