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纳米多孔钴薄膜的脉冲激光沉积

Pulsed laser deposition of nanoporous cobalt thin films.

作者信息

Jin Chunming, Nori Sudhakar, Wei Wei, Aggarwal Ravi, Kumar Dhananjay, Narayan Roger J

机构信息

Department of Biomedical Engineering, University of North Carolina, Chapel Hill, NC 27599, USA.

出版信息

J Nanosci Nanotechnol. 2008 Nov;8(11):6043-7. doi: 10.1166/jnn.2008.483.

Abstract

Nanoporous cobalt thin films were deposited on anodized aluminum oxide (AAO) membranes at room temperature using pulsed laser deposition. Scanning electron microscopy demonstrated that the nanoporous cobalt thin films retained the monodisperse pore size and high porosity of the anodized aluminum oxide substrates. Temperature- and field-dependent magnetic data obtained between 10 K and 350 K showed large hysteresis behavior in these materials. The increase of coercivity values was larger for nanoporous cobalt thin films than for multilayered cobalt/alumina thin films. The average diameter of the cobalt nanograins in the nanoporous cobalt thin films was estimated to be approsimately 5 nm for blocking temperatures near room temperature. These results suggest that pulsed laser deposition may be used to fabricate nanoporous magnetic materials with unusual properties for biosensing, drug delivery, data storage, and other technological applications.

摘要

在室温下使用脉冲激光沉积法将纳米多孔钴薄膜沉积在阳极氧化铝(AAO)膜上。扫描电子显微镜表明,纳米多孔钴薄膜保留了阳极氧化铝基底的单分散孔径和高孔隙率。在10 K至350 K之间获得的与温度和磁场相关的磁性数据表明,这些材料具有较大的磁滞行为。纳米多孔钴薄膜的矫顽力值增加幅度比多层钴/氧化铝薄膜更大。对于接近室温的阻断温度,纳米多孔钴薄膜中钴纳米颗粒的平均直径估计约为5 nm。这些结果表明,脉冲激光沉积可用于制造具有特殊性质的纳米多孔磁性材料,用于生物传感、药物递送、数据存储和其他技术应用。

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Pulsed laser deposition of nanoporous cobalt thin films.纳米多孔钴薄膜的脉冲激光沉积
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