Poxson David J, Schubert Martin F, Mont Frank W, Schubert E F, Kim Jong Kyu
Department of Physics, Applied Physics, and Astronomy, Future Chips Constellation, Rensselaer Polytechnic Institute, Troy, NY 12180, USA.
Opt Lett. 2009 Mar 15;34(6):728-30. doi: 10.1364/ol.34.000728.
An optimized graded-refractive-index (GRIN) antireflection (AR) coating with broadband and omnidirectional characteristics--as desired for solar cell applications--designed by a genetic algorithm is presented. The optimized three-layer GRIN AR coating consists of a dense TiO2 and two nanoporous SiO2 layers fabricated using oblique-angle deposition. The normal incidence reflectance of the three-layer GRIN AR coating averaged between 400 and 700 nm is 3.9%, which is 37% lower than that of a conventional single-layer Si3N4 coating. Furthermore, measured reflection over the 410-740 nm range and wide incident angles 40 degrees -80 degrees is reduced by 73% in comparison with the single-layer Si3N4 coating, clearly showing enhanced omnidirectionality and broadband characteristics of the optimized three-layer GRIN AR coating.
介绍了一种通过遗传算法设计的具有宽带和全向特性的优化渐变折射率（GRIN）抗反射（AR）涂层，这是太阳能电池应用所期望的。优化后的三层GRIN AR涂层由致密的TiO₂和两个采用斜角沉积制造的纳米多孔SiO₂层组成。三层GRIN AR涂层在400至700nm之间的平均正入射反射率为3.9%，比传统的单层Si₃N₄涂层低37%。此外，与单层Si₃N₄涂层相比，在410 - 740nm范围内和40度至80度的宽入射角下测得的反射率降低了73%，清楚地表明了优化后的三层GRIN AR涂层具有增强的全向性和宽带特性。
