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表面偶极层电势诱导的 n-烷硫醇自组装单层在 GaAs(001)上的红外吸收增强。

Surface dipole layer potential induced ir absorption enhancement in n-alkanethiol SAMs on GaAs(001).

机构信息

Department of Electrical and Computer Engineering, Université de Sherbrooke, Sherbrooke, Québec J1K 2R1, Canada.

出版信息

Langmuir. 2009 Dec 1;25(23):13561-8. doi: 10.1021/la901888q.

Abstract

The work function of n-alkanethiol self-assembled monolayers (SAMs) prepared on the GaAs(001) surface was measured using the Kelvin probe technique yielding the SAM 2D dipole layer potential (DLP). Direct n-dependent proportionality between the DLP values and the C-H stretching mode infrared (IR) absorption intensities was observed, which supports a correspondence of reported IR enhancements with the electrostatic properties of the interface. X-ray photoelectron spectroscopy is also used to verify the work function measurements. In addition, the principal components of the refractive index tensor are shown to be n-invariant in the ordered SAM phase. Our results suggest that a local field correction to the transition dipole moment accounts for the observed increase in IR activity through an increase to the electronic polarizability.

摘要

使用 Kelvin 探针技术测量了在 GaAs(001)表面制备的 n-烷硫醇自组装单层 (SAM) 的功函数,得到了 SAM 的二维偶极层电位 (DLP)。观察到 DLP 值与 C-H 伸缩模式红外 (IR) 吸收强度之间存在直接的 n 依赖性比例关系,这支持了报告的 IR 增强与界面静电特性的对应关系。X 射线光电子能谱也用于验证功函数测量。此外,还表明在有序 SAM 相中,折射率张量的主分量是 n 不变的。我们的结果表明,通过增加电子极化率,对跃迁偶极矩的局部场修正解释了观察到的 IR 活性增加。

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