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溶液沉积 C60 薄膜在垂直硅纳米间隙中的两端子分子存储器。

Two-terminal molecular memories from solution-deposited C60 films in vertical silicon nanogaps.

机构信息

Department of Chemistry, Rice University, Houston, Texas 77005, USA.

出版信息

ACS Nano. 2010 Apr 27;4(4):1879-88. doi: 10.1021/nn901566v.

Abstract

We demonstrate here two-terminal, charge-based memory from C60 films inside vertical 7 nm silicon nanogap devices. This testbed structure eliminated the possibility of metal migration in the nanostructure because the two electrodes are made solely of silicon; hence, the often troublesome and confusing possibility of filamentary metal formation is obviated. Saturated solutions of C60 in toluene, mesitylene, and 1-methylnaphthalene were each used to deposit these films at elevated temperatures. Electrical I-V measurements reveal a high yield (67%) of devices demonstrating bipolar, switchable hysteresis from both the mesitylene- and 1-methylnaphthalene-deposited devices, while the toluene-grafted devices display no such behavior. Pulse-based memory measurements of switching devices indicate high ON/OFF ratios (maximum approximately 1500), good stability (>100 cycles without device degradation) for molecular devices, and low operating currents (approximately 10(-11) A) in room temperature testing.

摘要

我们在此展示了基于 C60 薄膜的两端电荷存储垂直 7nm 硅纳米隙器件。这种测试平台结构排除了纳米结构中金属迁移的可能性,因为两个电极完全由硅制成;因此,通常令人困扰和混淆的丝状金属形成的可能性被消除了。甲苯、均三甲苯和 1-甲基萘的 C60 饱和溶液都被用来在高温下沉积这些薄膜。电 I-V 测量显示,具有双极性、可切换迟滞的器件的高产量(67%)来自于均三甲苯和 1-甲基萘沉积的器件,而甲苯接枝的器件则没有这种行为。开关器件的基于脉冲的存储测量表明,在室温测试中,分子器件具有高的 ON/OFF 比(最高约为 1500)、良好的稳定性(>100 个循环而无器件退化)和低工作电流(约 10(-11) A)。

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