Department of Therapeutic Radiology, Yale School of Medicine, New Haven, Connecticut, United States of America.
PLoS Genet. 2010 Apr 29;6(4):e1000926. doi: 10.1371/journal.pgen.1000926.
Telomeric repeats preserve genome integrity by stabilizing chromosomes, a function that appears to be important for both cancer and aging. In view of this critical role in genomic integrity, the telomere's own integrity should be of paramount importance to the cell. Ultraviolet light (UV), the preeminent risk factor in skin cancer development, induces mainly cyclobutane pyrimidine dimers (CPD) which are both mutagenic and lethal. The human telomeric repeat unit (5'TTAGGG/CCCTAA3') is nearly optimal for acquiring UV-induced CPD, which form at dipyrimidine sites. We developed a ChIP-based technique, immunoprecipitation of DNA damage (IPoD), to simultaneously study DNA damage and repair in the telomere and in the coding regions of p53, 28S rDNA, and mitochondrial DNA. We find that human telomeres in vivo are 7-fold hypersensitive to UV-induced DNA damage. In double-stranded oligonucleotides, this hypersensitivity is a property of both telomeric and non-telomeric repeats; in a series of telomeric repeat oligonucleotides, a phase change conferring UV-sensitivity occurs above 4 repeats. Furthermore, CPD removal in the telomere is almost absent, matching the rate in mitochondria known to lack nucleotide excision repair. Cells containing persistent high levels of telomeric CPDs nevertheless proliferate, and chronic UV irradiation of cells does not accelerate telomere shortening. Telomeres are therefore unique in at least three respects: their biophysical UV sensitivity, their prevention of excision repair, and their tolerance of unrepaired lesions. Utilizing a lesion-tolerance strategy rather than repair would prevent double-strand breaks at closely-opposed excision repair sites on opposite strands of a damage-hypersensitive repeat.
端粒重复序列通过稳定染色体来保护基因组的完整性,这一功能对于癌症和衰老都很重要。鉴于端粒在基因组完整性方面的关键作用,端粒本身的完整性对细胞来说应该是至关重要的。紫外线(UV)是皮肤癌发展的主要危险因素,主要诱导形成嘧啶二聚体(CPD),它既有致突变性又有细胞毒性。人类端粒重复序列单元(5’TTAGGG/CCCTAA3’)几乎是获取 UV 诱导的 CPD 的最佳序列,CPD 形成于二嘧啶位点。我们开发了一种基于 ChIP 的技术,即 DNA 损伤免疫沉淀(IPoD),以同时研究端粒和编码区 p53、28S rDNA 和线粒体 DNA 中的 DNA 损伤和修复。我们发现,人类端粒在体内对 UV 诱导的 DNA 损伤的敏感性是正常的 7 倍。在双链寡核苷酸中,这种敏感性是端粒和非端粒重复序列的共同特性;在一系列端粒重复寡核苷酸中,一个相位变化赋予了超过 4 个重复的 UV 敏感性。此外,端粒中的 CPD 去除几乎不存在,与已知缺乏核苷酸切除修复的线粒体中的速度相匹配。尽管含有持续高水平端粒 CPD 的细胞仍能增殖,但慢性 UV 照射不会加速端粒缩短。端粒至少在三个方面是独特的:它们的物理 UV 敏感性、它们对切除修复的预防作用以及它们对未修复损伤的容忍度。利用损伤容忍策略而不是修复策略可以防止在损伤敏感重复的相反链上紧密相邻的切除修复位点处发生双链断裂。