Institute of Analytical Chemistry and Radiochemistry, Leopold-Franzens University, Innrain 52a, 6020 Innsbruck, Austria; Sandoz GmbH, 6250 Kundl, Austria.
Eur J Pharm Biopharm. 2010 Oct;76(2):320-7. doi: 10.1016/j.ejpb.2010.06.015. Epub 2010 Jun 30.
NIR spectroscopy was applied to develop a fast and reliable quality control system for a pharmaceutical substance to support information obtained through PAT surveillance of its manufacturing process. After calculating different quantitative calibrations of the substance's key quality parameters, a general classification model has been derived to capture the over-all product grade. The final spectral quality conformity model consisting of 96 representative batches - covering high process variability - was sensibilized toward five important quality parameters by their incorporation as PLS responses. The model characteristics were extensively investigated and interpreted to derive a reasonable limit for the reduced chemometric summary quality measure (Hotteling's T(2)). Through this parameter new batches can be assessed easily by their NIR spectra, using versatile test batches for confirmation. Different sets of good quality batches, bad production batches beyond the respective chemical quality limit and synthetic batches exactly at the limit could be accurately assigned through their multivariate evaluation to a large extend. However, high model sensitivity to non-relevant product properties can lead to limited applicability of the model. This may be caused by restricted bandwidth of quality parameters in production environment for calibration, repack effects and high process instability.
近红外光谱学被应用于开发一种快速可靠的药物质量控制系统,以支持通过 PAT 监测其生产过程获得的信息。在计算了物质关键质量参数的不同定量校正后,得出了一个通用分类模型,以捕获总体产品等级。最终的光谱质量一致性模型由 96 个具有代表性的批次组成——涵盖了高过程变异性——通过将其作为 PLS 响应纳入,对五个重要的质量参数进行了敏感性处理。对模型特征进行了广泛的研究和解释,以得出合理的简化化学计量学综合质量度量(Hotteling 的 T(2))限制。通过该参数,新批次可以通过其近红外光谱轻松进行评估,并使用多功能测试批次进行确认。不同组的高质量批次、超出各自化学质量限制的不良生产批次和正好在限制范围内的合成批次,可以通过其多元评估在很大程度上准确地分配到一个类别中。然而,模型对非相关产品属性的高度敏感性可能会导致模型的应用受限。这可能是由于校准过程中质量参数的带宽受限、重新包装效应和高过程不稳定性造成的。