CEA-CNRS group Nanophysique et Semiconducteurs, Institut Néel/CNRS-Université J Fourier and CEA Grenoble, INAC, Grenoble, France.
Nanotechnology. 2010 Oct 15;21(41):415702. doi: 10.1088/0957-4484/21/41/415702. Epub 2010 Sep 16.
The growth and structural properties of GaN/AlN core-shell nanowire heterostructures have been studied using a combination of resonant x-ray diffraction, Raman spectroscopy and high resolution transmission electron microscopy experiments. For a GaN core of 20 nm diameter on average surrounded by a homogeneous AlN shell, the built-in strain in GaN is found to agree with theoretical calculations performed using a valence force field model. It is then concluded that for an AlN thickness up to at least 12 nm both core and shell are in elastic equilibrium. However, in the case of an inhomogeneous growth of the AlN shell caused by the presence of steps on the sides of the GaN core, plastic relaxation is found to occur. Consistent with the presence of dislocations at the GaN/AlN interface, it is proposed that this plastic relaxation, especially efficient for AlN shell thickness above 3 nm, is promoted by the shear strain induced by the AlN inhomogeneity.
采用共振 X 射线衍射、拉曼光谱和高分辨率透射电子显微镜实验相结合的方法,研究了 GaN/AlN 核壳纳米线异质结构的生长和结构特性。对于平均直径为 20nm 的 GaN 核,周围是均匀的 AlN 壳,发现 GaN 中的本征应变与使用价力场模型进行的理论计算一致。然后得出结论,对于厚度至少为 12nm 的 AlN,核和壳都处于弹性平衡状态。然而,在 GaN 核侧面存在台阶导致 AlN 壳不均匀生长的情况下,发现会发生塑性松弛。与 GaN/AlN 界面处存在位错一致,提出这种塑性松弛,特别是对于厚度超过 3nm 的 AlN 壳,是由 AlN 不均匀性引起的剪切应变促进的。