Increased sensitivity to in-plane displacements in electronic speckle pattern interferometry.

We describe an optical arrangement that increases the sensitivity to in-plane displacement in an electronic speckle-pattern interferometric system. This is accomplished by oblique illumination and observation along the direction of illumination. An anamorphic prism placed in front of the object is used to correct for the eccentricity in the image caused by the oblique observation. The sensitivity to in-plane displacement can be increased to a maximum of approximately λ/2. Experimental results including phase stepping are presented.