Joenathan C, Sohmer A, Bürkle L
Appl Opt. 1995 Jun 1;34(16):2880-5. doi: 10.1364/AO.34.002880.
We describe an optical arrangement that increases the sensitivity to in-plane displacement in an electronic speckle-pattern interferometric system. This is accomplished by oblique illumination and observation along the direction of illumination. An anamorphic prism placed in front of the object is used to correct for the eccentricity in the image caused by the oblique observation. The sensitivity to in-plane displacement can be increased to a maximum of approximately λ/2. Experimental results including phase stepping are presented.
我们描述了一种光学装置，该装置可提高电子散斑图案干涉测量系统中对平面内位移的灵敏度。这是通过沿照明方向进行斜照明和观察来实现的。放置在物体前方的变形棱镜用于校正由斜观察引起的图像偏心。对平面内位移的灵敏度可提高到最大约为λ/2。文中给出了包括相移在内的实验结果。
