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通过在金电极上的自组装单分子层上的欠电位沉积来测定镉离子的低浓度。

Determination of low levels of cadmium ions by the under potential deposition on a self-assembled monolayer on gold electrode.

机构信息

Institute of Chemistry, The Hebrew University of Jerusalem, Jerusalem 91904, Israel.

出版信息

Anal Chim Acta. 2011 Jan 17;684(1-2):1-7. doi: 10.1016/j.aca.2010.10.021. Epub 2010 Oct 20.

Abstract

The electrochemical determination of low levels of Cd using a self-assembled monolayer (SAM) modified Au electrode is reported. Determination was based on the stripping of Cd, which was deposited by under potential deposition (UPD). A series of short alkanethiol SAMs bearing different end groups, i.e., sulfonate, carboxylate and ammonium, were examined. Lowest level of detection (ca. 50 ngL(-1)) was achieved with a 3-mercaptopropionic acid (MPA) monolayer using subtractive anodic square wave voltammetry (SASV). Additional surface methods, namely, reductive desorption and X-ray photoelectron spectroscopy, were applied to determine the interfacial structure of the electrodeposited Cd on the modified electrodes. We conclude that the deposited Cd forms a monoatomic layer, which bridges between the gold surface and the alkanethiol monolayer associating with both the gold and the sulfur atoms.

摘要

本文报道了一种使用自组装单分子层(SAM)修饰金电极电化学测定痕量 Cd 的方法。测定基于通过欠电位沉积(UPD)沉积的 Cd 的溶出。研究了一系列具有不同末端基团(即磺酸盐、羧酸盐和铵盐)的短链烷硫醇 SAM。使用减去阳极方波伏安法(SASV),在 3-巯基丙酸(MPA)单层上获得了最低检测限(约 50ngL(-1))。此外,还采用还原解吸和 X 射线光电子能谱等表面方法来确定修饰电极上电沉积 Cd 的界面结构。我们得出结论,沉积的 Cd 形成了一个单原子层,该原子层在金表面和与金和硫原子都结合的烷硫醇单层之间架桥。

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