School of Environmental Science and Engineering, Gwangju Institute of Science and Technology (GIST), 261 Cheomdan-gwagiro, Buk-gu, Gwangju 500-712, South Korea.
Water Res. 2011 Feb;45(5):1933-40. doi: 10.1016/j.watres.2010.12.024. Epub 2010 Dec 28.
The removal of arsenite (As(III)) was investigated using a combined ozonation-reactive ceramic membrane incorporated with iron oxide nanoparticles (IONs). A disk-type γ-Al(2)O(3) ultrafiltration membrane (CM) was covered with IONs using an annealing method. The reactive ceramic membrane (RM) was then characterized using SEM, zeta potential measurements, and pure water permeability tests. The results showed that IONs were well attached on the RM surface. In addition, doped IONs had no significant effects on the pure water permeability and the isoelectric point (IEP) of RM. Laboratory-scale experiments were subsequently conducted to investigate the impact of combined RM and ozonation processes on As(III) rejection. The experimental results revealed that As(III) rejection rate of RM with an ozonation process (92%) significantly enhanced compared with that of CM (63%). The influence of operating parameters (i.e., pH, NOM, co-existing ions and temperature) revealed that an increase of pH, a decrease of temperature and presence of NOM led to a higher As(III) rejection, whereas the presence of co-existing ions in the feed water significantly reduced the As(III) rejection; divalent counter-ions were the greatest inhibitors for As(III) rejection. Finally, a comparison of As(III) rejection in synthetic water and real groundwater confirmed the importance of real conditions in the hybrid reactive membrane process with continuous ozonation.
采用载铁纳米氧化 物颗粒（IONs）的臭氧氧化-反应性陶瓷膜联用体系去除亚砷酸盐（As(III)）。通过退火法将 IONs 覆盖到盘式γ-Al(2)O(3)超滤膜（CM）上。然后采用 SEM、动电电位测量和纯水透过率测试对反应性陶瓷膜（RM）进行了表征。结果表明，IONs 很好地附着在 RM 表面上。此外，掺杂 IONs 对 RM 的纯水透过率和等电点（IEP）没有显著影响。随后进行了实验室规模的实验，以研究 RM 和臭氧氧化联合工艺对 As(III)去除的影响。实验结果表明，与 CM（63%）相比，RM 与臭氧氧化工艺联用（92%）的 As(III)去除率显著提高。操作参数（pH、NOM、共存离子和温度）的影响表明，pH 值升高、温度降低和 NOM 的存在会导致更高的 As(III)去除率，而进水共存离子的存在会显著降低 As(III)去除率；二价抗衡离子对 As(III)去除的抑制作用最大。最后，对合成水和实际地下水的 As(III)去除效果进行比较，证实了连续臭氧氧化的混合反应性膜工艺在实际条件下的重要性。
