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受限在线性介孔中的亚稳流体中的空化现象。

Cavitation in metastable fluids confined to linear mesopores.

机构信息

Institut des NanoSciences de Paris (INSP), Université Paris 6 , UMR-CNRS 75-88, 4 Place Jussieu 75005 Paris, France.

出版信息

Langmuir. 2011 Mar 15;27(6):2364-74. doi: 10.1021/la104777y. Epub 2011 Feb 8.

Abstract

We study the adsorption process of nitrogen (at 77.4 and 51.3 K) and argon (at 60 K) in porous silicon duplex layers, Si/A/B and Si/B/A, where the pores of A are on average narrower than the pores of B. We compare the experimental isotherms to that calculated from elemental isotherms measured in layers A and B supported by or detached from the silicon substrate. This allows us to confirm our previous studies which show that the relaxation of the substrate constraint modifies the adsorption strains and leads to a decrease of the adsorbed amount before condensation and consequently increases the condensation pressure. In the so-called ink-bottle Si/B/A configuration, layer B empties while layer A remains filled which proves that layer B empties via cavitation. The vapor pressure at which cavitation occurs in layer B in Si/B/A configuration is close to the pressure at which the same layer empties when it is in direct contact with the gas reservoir (Si/A/B configuration) which indicates that layer B contains all the ingredients necessary for cavitation to occur. The absolute value of the liquid pressure at which cavitation occurs is much lower than the value predicted by the theory of homogeneous nucleation. Nucleation of gas bubbles thus takes place on the surface of the pore walls. This is the crucial point of the paper. A receding meniscus with a contact angle lower than π/2 inside a pore and a gas bubble with a contact angle higher than π/2 are thus mutually exclusive. A receding meniscus cannot enter a pore. This has nothing to do with a pore-blocking effect; this is related to the physical parameters which define the contact angle inside the pores, that is, the surface energies at the solid-liquid, solid-vapor, and liquid-vapor interfaces. For argon at 60 K in the Si/B/A duplex layer, cavitation in layer B activates the emptying of a fraction of pores of layer A which constitutes a direct observation of metastable states.

摘要

我们研究了氮气(在 77.4 和 51.3 K 下)和氩气(在 60 K 下)在多孔硅双层 Si/A/B 和 Si/B/A 中的吸附过程,其中 A 层的孔平均比 B 层的孔窄。我们将实验等温线与从支撑或不支撑硅衬底的 A 和 B 层测量的元素等温线计算出的等温线进行比较。这使我们能够证实我们之前的研究结果,即衬底约束的弛豫会改变吸附应变,并导致在冷凝前吸附量减少,从而增加冷凝压力。在所谓的瓶中硅 Si/B/A 结构中,B 层排空而 A 层保持充满,这证明了 B 层通过空化排空。在 Si/B/A 配置中 B 层发生空化的蒸气压接近于当它与气体储层(Si/A/B 配置)直接接触时相同层排空的压力,这表明 B 层包含发生空化所需的所有成分。发生空化的液体压力的绝对值远低于均相成核理论预测的值。因此,气泡的成核发生在孔壁的表面上。这是本文的关键。在孔内,低于 π/2 的接触角的后退弯月面和高于 π/2 的接触角的气泡是相互排斥的。后退弯月面不能进入孔内。这与孔阻塞效应无关,而是与定义孔内接触角的物理参数有关,即固-液、固-气和液-气界面的表面能。对于在 Si/B/A 双层中的 60 K 下的氩气,B 层中的空化激活了 A 层的一部分孔的排空,这是对亚稳态的直接观察。

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