Fitzpatrick Institute for Photonics, Duke University, Durham, NC 27708, USA.
Nanotechnology. 2011 Apr 22;22(16):165301. doi: 10.1088/0957-4484/22/16/165301. Epub 2011 Mar 11.
In this paper, we describe wafer-scale fabrication and characterization of plasmonic chips-containing different sizes and spacings of metallic micro- and nanoline structures-using deep UV lithography. Using a high dose (25 mJ cm( - 2)) and a proper lift-off process, feature sizes as small as 25 nm are obtained. Moreover, we study the dependence of surface plasmon resonance on the angle of incidence and wavelength for different micro- and nanoline size and spacing values, yielding localized to quasi-propagative plasmonic behaviors. Rigorous coupled wave analysis (RCWA) techniques are employed to numerically confirm these experimental observations. Finally, the refractive index of media around the SPRI sensor chips is varied, showing the angulo-spectral regions of higher sensitivity for each type of structure.
本文采用深紫外光刻技术，描述了等离子体芯片的晶圆级制造和特性，其中包含不同尺寸和间距的金属微纳线结构。通过使用高剂量（25mJ/cm²）和适当的剥离工艺，可以获得小至 25nm 的特征尺寸。此外，我们还研究了不同微纳线尺寸和间距值的表面等离子体共振对入射角和波长的依赖性，得到了局域到准传播等离子体的行为。采用严格耦合波分析（RCWA）技术对这些实验观察结果进行了数值确认。最后，改变了 SPRI 传感器芯片周围介质的折射率，显示了每种结构的更高灵敏度的角谱区域。
