基底光洁度和薄膜粗糙度对Mo/Si多层膜光学性能的影响。

Influence of the substrate finish and thin film roughness on the optical performance of Mo/Si multilayers.

作者信息

Trost Marcus, Schröder Sven, Feigl Torsten, Duparré Angela, Tünnermann Andreas

机构信息

Fraunhofer Institute for Applied Optics and Precision Engineering (IOF), Jena, Germany.

出版信息

Appl Opt. 2011 Mar 20;50(9):C148-53. doi: 10.1364/AO.50.00C148.

DOI:10.1364/AO.50.00C148

PMID:21460930

Abstract

Scattering resulting from interface imperfections critically affects the image contrast and optical throughput of multilayer coatings for 13.5 nm. To investigate the scattering mechanisms, at-wavelength scattering measurements in combination with atomic force microscopy are analyzed for an in-depth characterization of the roughness properties. The different impacts of substrate finish and intrinsic thin film roughness on the scattering distribution are separated and analyzed in detail. Furthermore, a novel approach to characterize the roughness of large extreme ultraviolet substrates is presented, based on light scattering measurements at 442 nm.

摘要

由界面缺陷引起的散射严重影响了用于13.5纳米的多层涂层的图像对比度和光学通量。为了研究散射机制，结合原子力显微镜对波长处的散射测量进行了分析，以深入表征粗糙度特性。详细分离并分析了衬底光洁度和本征薄膜粗糙度对散射分布的不同影响。此外，还提出了一种基于442纳米光散射测量来表征大型极紫外衬底粗糙度的新方法。